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Author

Marc Noot

Observed name: M. J. Noot
Institution: ASML (Netherlands)
OpenAlex ID: A5014676393
A study of swing-curve physics in diffraction-based overlay
2016 · Kaustuve Bhattacharyya, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30
A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection
2017 · Kaustuve Bhattacharyya, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Multi-wavelength approach towards on-product overlay accuracy and robustness
2018 · Guo-Tsai Huang, Cathy Wang, et al. · Metrology, Inspection, and Process Control XXXVI · 14
A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography
2010 · C. M. Ke, Victor Shih, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Taking the multi-wavelength DBO to the next level of accuracy and robustness
2020 · Jinsun Kim, Jeongijn Lee, et al. · Metrology, Inspection, and Process Control XXXVI · 7
Color mixing in overlay metrology for greater accuracy and robustness
2019 · Simon Mathijssen, Marc Noot, et al. · Metrology, Inspection, and Process Control XXXVI · 6
Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness
2024 · Jungmin Lee, Inbeom Yim, et al. · Metrology, Inspection, and Process Control XXXVI · 5
Applications of on-product diffraction-based focus metrology in logic high volume manufacturing
2016 · Ben F. Noyes, Babak Mokaberi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy
2009 · Chih-Ming Ke, Jimmy Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Characterization of metrology to device overlay offset and novel methods to minimize it
2021 · Kaustuve Bhattacharyya, Ken Chang, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 2
YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production
2019 · Jang-Sun Kim, Jin-Moo Byun, et al. · Metrology, Inspection, and Process Control XXXVI · 2
FEM Model to Support Electro Chemical Drilling of Turbulated Cooling Holes
1994 · M. H. H. van Dijk, B. T. M. Verhappen, et al. · Volume 5: Manufacturing Materials and Metallurgy; Ceramics; Structures and Dynamics; Controls, Diagnostics and Instrumentation; Education; General · 2
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Enhancing the applications space of diffraction based overlay metrology by increasing throughput and target pitch flexibility
2020 · Simon Mathijssen, Herman Heijmerikx, et al. · Metrology, Inspection, and Process Control XXXVI · 1
Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop
2016 · Jiarui Hu, Y. L. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Improving lithographic performance for 32 nm
2010 · Jens Busch, Anne Parge, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements
2023 · Jungmin Lee, Doogyu Lee, et al. · Metrology, Inspection, and Process Control XXXVI
Accuracy aware pixel selection in multi-wavelength uDBO metrology enables higher robustness and accuracy for DRAM
2021 · Chia Hung Chen, Sheng-Tsung Tsao, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Use of scatterometry for scanner matching
2011 · Holger Bald, Rolf Seltmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 18
Citation count: 105
H-index: 6
I10-index: 3
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