A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography
Year: 2010
Type: conference-paper
DOI: 10.1117/12.853318
Authors: C. M. Ke, Victor Shih, Jacky Huang, L. J. Chen, Willie Wang, G. T. Huang, W. T. Yang, Sophia Wang, C. R. Liang, H. H. Liu, H. J. Lee, L. G. Terng, T. S. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Marc Noot, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Gavin Liu, Wei-Shun Tzeng, Jim Chen, Andreas Fuchs, Omer Adam, Cathy Wang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2017453054