Author

Omer A. O. Adam

Observed names: Adam, O.A.O., Adam, OAO (Omer), O. A. O. Adam, O. Adam, Omer Adam

Institution: ASML (Netherlands)

Observed institutions: Eindhoven University of Technology, ASML (Netherlands), University of Twente

OpenAlex ID: A5110030633

Self-organized, one-dimensional Pt nanowires on Ge(001)

2003 · Oguzhan Gurlu, Omer A. O. Adam, et al. · Applied Physics Letters · 147

Probing quantum wells induced above a subsurface nanocavity in copper

2008 · O. Kurnosikov, O. A. O. Adam, et al. · Physical Review B · 32

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STM-induced desorption of hydrogen from Co nanoislands

2008 · M. Sicot, O. Kurnosikov, et al. · Physical Review B · 28

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Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

2015 · Kaustuve Bhattacharyya, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

2017 · Kaustuve Bhattacharyya, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes

2016 · Leon Verstappen, Evert Mos, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

2010 · C. M. Ke, Victor Shih, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

2009 · Victor Shih, Jacky Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

An integrated approach to holistic metrology qualification for multi-patterning process layers: AM: Advanced metrology

2016 · Emil Schmitt-Weaver, Lotte Willems, et al. · ASMC proceedings · 3

Single-Atom Manipulation of Co Embedded in Cu(001) Surfaces

2006 · Omer A. O. Adam, Oleg Kurnosikov, et al. · Japanese Journal of Applied Physics · 2

A holistic scanner matching solution for productivity enhancement in a Giga fab

2010 · Victor Shih, R. C. Peng, et al. · ASMC proceedings · 1

Detection and manipulation of metallic and magnetic nanostructures:an STM study on (sub)surface atoms, cavities and islands

2008 · Adam, OAO (Omer) · TU/e Research Portal

Quantum well states induced by subsurface nanocavities

2007 · O. Kurnosikov, Omer Adam, et al.

STS on a Subsurface Nanoscaled Inhomogeneities

2006 · Omer Adam, O. Kurnosikov, et al.

Co atoms and nanoislands on Cu(001) and Al203 surfaces: LT-STM characterization

2004 · Omer Adam, O. Kurnosikov, et al.

Initial Stages of Pt Deposition onto Ge(001) and nanowire Formation

2003 · Gurlu, O., Adam, O.A.O., et al. · University of Twente Research Information

Works count: 16

Citation count: 277

H-index: 7

I10-index: 6