Get started
Author

Vidya Vaenkatesan

Observed names: V Vidya Vaenkatesan, V. Vaenkatesan
Institution: ASML (Netherlands)
OpenAlex ID: A5017342673
Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography
2015 · Jan Mulkens, Michael Hanna, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 72
Adhesion and friction behaviours of polydimethylsiloxane – A fresh perspective on JKR measurements
2006 · Vidya Vaenkatesan, Zhili Li, et al. · Polymer · 52
YieldStar: a new metrology platform for advanced lithography control
2011 · Jos Maas, Martin Ebert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29
Improving the Brightness and Daylight Contrast of Organic Light‐Emitting Diodes
2005 · V. Vaenkatesan, R. T. Wegh, et al. · Advanced Functional Materials · 27
Impact of an etched EUV mask black border on imaging and overlay
2012 · Natalia Davydova, Robert de Kruif, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015 · N. Davydova, R. Kottumakulal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment
2015 · D. J. Maas, T. Fliervoet, et al. · Review of Scientific Instruments · 7
Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
2019 · Vidya Vaenkatesan, Paul van Adrichem, et al. · Photomask and next-generation lithography mask technology. Conference · 6
Controlling the resist profile in EUV imaging using source mask optimization
2025 · Parul Dhagat, Sofia Leitao, et al. · International Conference on Extreme Ultraviolet Lithography · 4
Holistic assessment and control of total CDU
2024 · Jo Finders, Vidya Vaenkatesan, et al. · SPIE Optical and EUV Nanolithography · 4
LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics
2024 · Dominykas Gustas, Sam Borman, et al. · International Conference on Extreme Ultraviolet Lithography · 3
Enhancing lithography precision: characterizing resist profiles in semiconductor manufacturing with rapid probe microscopy
2024 · Lei Feng, Vishal Panchal, et al. · International Conference on Extreme Ultraviolet Lithography · 3
Mask roughness contribution to wafer edge placement error
2023 · Andreas Frommhold, Joern-Holger Franke, et al. · SPIE Optical and EUV Nanolithography · 3
Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations
2021 · Adam Lyons, Luke Long, et al. · Extreme Ultraviolet (EUV) Lithography · 3
E-beam based EUV mask characterization for studying mask induced wafer effects
2018 · Vidya Vaenkatesan, Qing Tian, et al. · SPIE Photomask Technology Conference · 3
Measurement and adjustment of resist SWA in EUV lithography
2025 · Jo Finders, Vidya Vaenkatesan, et al. · SPIE Optical and EUV Nanolithography · 2
Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry
2011 · Frank A. J. M. Driessen, Natalia Davydova, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
YieldStar based reticle 3D measurements and its application
2016 · Vidya Vaenkatesan, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Understanding and counteracting the resist 3D effects in EUV lithography from aerial image and diffraction properties to directional defects in photoresist/etched patterns
2026 · Jo Finders, Ruben Maas, et al. · International Conference on Extreme Ultraviolet Lithography
YieldStar based reticle 3D measurements and its application
2015 · Vidya Vaenkatesan, Twan Schellekens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Investigating interfacial behavior of PDMS using an advanced JKR apparatus
2005 · V Vidya Vaenkatesan, WP Willem Pier Vellinga, et al. · TU/e Research Portal
PDF
Interfacial studies on PDMS using an advanced JKR apparatus
2004 · V Vidya Vaenkatesan, Z Zhili Li, et al. · TU/e Research Portal
PDF
Works count: 22
Citation count: 247
H-index: 7
I10-index: 5
Year
Topic
Type