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Woo‐Hee Kim
Observed names:
Kim Woo-Hee,
Kim, Woo-Hee,
Kim, WooHee,
Woo-Hee Kim,
김우희
Institution:
Hanyang University
Observed institutions:
Pohang University of Science and Technology,
Yonsei University,
Samsung (South Korea),
Kyung Hee University,
Samsung Electronics (South Korea),
Hanyang University,
Jeonbuk National University,
Stanford University
show all 8
ORCID:
0000-0003-0868-7479
Observed ORCID:
0000-0003-0868-7479
OpenAlex ID:
A5022732820
2D Transition Metal Dichalcogenide Heterostructures for p‐ and n‐Type Photovoltaic Self‐Powered Gas Sensor
2020
·
Youngjun Kim
, Sangyoon Lee
, et al.
·
Advanced Functional Materials
·
240
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors
2018
·
Rizwan Khan
, Bonggeun Shong
, et al.
·
Chemistry of Materials
·
136
Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
2017
·
Joseph A. Singh
, Nick F. W. Thissen
, et al.
·
Chemistry of Materials
·
121
PDF
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
2017
·
Seunggi Seo
, Byung Chul Yeo
, et al.
·
ACS Applied Materials & Interfaces
·
104
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
2007
·
Sang-Joon Park
, Woo-Hee Kim
, et al.
·
Microelectronic Engineering
·
103
A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation
2016
·
Woo-Hee Kim
, Fatemeh Sadat Minaye Hashemi
, et al.
·
ACS Nano
·
102
Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition
2008
·
Woo-Hee Kim
, Sang-Joon Park
, et al.
·
Nanotechnology
·
90
PDF
Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition
2010
·
Woo-Hee Kim
, Han-Bo-Ram Lee
, et al.
·
Journal of The Electrochemical Society
·
88
PDF
Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide
2016
·
Adriaan J. M. Mackus
, Callisto MacIsaac
, et al.
·
The Journal of Chemical Physics
·
87
PDF
Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
2021
·
Jinseon Lee
, Jeong‐Min Lee
, et al.
·
Advanced Functional Materials
·
77
Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
2010
·
Woo-Hee Kim
, W.J. Maeng
, et al.
·
Thin Solid Films
·
74
High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant
2009
·
Han-Bo-Ram Lee
, Woo-Hee Kim
, et al.
·
Journal of The Electrochemical Society
·
73
PDF
Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric
2014
·
Jae-Seung Lee
, Woo-Hee Kim
, et al.
·
Applied Surface Science
·
68
Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films
2011
·
Taewook Nam
, Jae-Min Kim
, et al.
·
Journal of the Korean Physical Society
·
66
Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO 2 films obtained from metal halide and amide precursors
2018
·
Il-Kwon Oh
, Bo-Eun Park
, et al.
·
Journal of Materials Chemistry C
·
56
Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas
2009
·
Woo-Hee Kim
, Sang-Joon Park
, et al.
·
Journal of the Korean Physical Society
·
56
Low Pressure Chemical Vapor Deposition of Aluminum-Doped Zinc Oxide for Transparent Conducting Electrodes
2011
·
Woo-Hee Kim
, W. J. Maeng
, et al.
·
Journal of The Electrochemical Society
·
53
PDF
Electronic Structure of Cerium Oxide Gate Dielectric Grown by Plasma-Enhanced Atomic Layer Deposition
2011
·
Woo-Hee Kim
, W. J. Maeng
, et al.
·
Journal of The Electrochemical Society
·
50
Plasma-Enhanced Atomic Layer Deposition of Ni
2010
·
Han-Bo-Ram Lee
, Sung-Hwan Bang
, et al.
·
Japanese Journal of Applied Physics
·
50
PDF
Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen
2008
·
Sang-Joon Park
, Woo-Hee Kim
, et al.
·
Thin Solid Films
·
49
Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y 2 O 3 with Ozone
2017
·
Hanearl Jung
, Woo-Hee Kim
, et al.
·
ACS Applied Materials & Interfaces
·
48
Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition
2020
·
Il-Kwon Oh
, Woo-Hee Kim
, et al.
·
ACS Nano
·
45
PDF
Structural and ferroelectric properties of P(VDF-TrFE) thin films depending on the annealing temperature
2018
·
Jeongdae Seo
, Jong Yeog Son
, et al.
·
Materials Letters
·
44
Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
2016
·
Hanearl Jung
, Woo-Hee Kim
, et al.
·
Journal of Materials Science
·
43
The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO3 thin films
2013
·
Woo-Hee Kim
, Jong Yeog Son
·
Applied Physics Letters
·
43
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Works count:
140
Citation count:
3,303
H-index:
35
I10-index:
76
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