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Nicholas J. Chittock

Observed names: Chittock, Nicholas, Chittock, Nicholas John, Nicholas John Chittock
ORCID: 0000-0003-0541-0175
Observed ORCID: 0000-0003-0541-0175
OpenAlex ID: A5024008821
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices
2022 · Sven H. Gerritsen, Nicholas J. Chittock, et al. · ACS Applied Nano Materials · 65
Precise ion energy control with tailored waveform biasing for atomic scale processing
2020 · Tahsin Faraz, Yuri G. P. Verstappen, et al. · Journal of Applied Physics · 62
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Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3
2020 · Nicholas J. Chittock, Martijn F. J. Vos, et al. · Applied Physics Letters · 29
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Investigation of the atomic layer etching mechanism for Al 2 O 3 using hexafluoroacetylacetone and H 2 plasma
2024 · Nicholas J. Chittock, Joost F. W. Maas, et al. · Journal of Materials Chemistry C · 19
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Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3
2023 · Nicholas J. Chittock, Yi Shu, et al. · Journal of Applied Physics · 19
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Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma
2025 · Olaf C. A. Bolkenbaas, Marc J. M. Merkx, et al. · Chemistry of Materials · 3
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Atomic layer etching of TiN by oxidation and SF6-H2 plasma exposure: ALE window defined by HF, H, and F
2025 · Guillaume Krieger, Silke A. Peeters, et al. · Applied Physics Letters · 2
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(Invited) The Use of Plasmas for Isotropic Atomic Layer Etching
2023 · Nicholas John Chittock, Wilhelmus M. M. (Erwin) Kessels, et al. · ECS Meeting Abstracts · 1
Etching with atomic-level precision : The emerging field of atomic layer etching
2020 · Adriaan J. M. Mackus, Tahsin Faraz, et al. · TU/e Research Portal · 1
Works count: 14
Citation count: 202
H-index: 5
I10-index: 5
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