Author

Martina Lattemann

Observed names: Lattemann, M., M Lattemann, M. Latteman, M. Lattemann

Observed institutions: Linköping University, Karlsruhe Institute of Technology, The University of Sydney, Sandvik (Sweden), Curtin University, Technische Universität Darmstadt

ORCID: 0000-0003-3500-8144

Observed ORCID: 0000-0003-3500-8144

OpenAlex ID: A5025479661

Ionized physical vapor deposition (IPVD): A review of technology and applications

2006 · Ulf Helmersson, Martina Lattemann, et al. · Thin Solid Films · 1,116

The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

2006 · J. Bohlmark, M. Lattemann, et al. · Thin Solid Films · 339

On the origin of a third spectral component of C1s XPS-spectra for nc-TiC/a-C nanocomposite thin films

2008 · E. Lewin, P.O.Å. Persson, et al. · Surface and Coatings Technology · 202

Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

2005 · M. Lattemann, A.P. Ehiasarian, et al. · Surface and Coatings Technology · 162

Cross-field ion transport during high power impulse magnetron sputtering

2008 · Daniel Lundin, Petter Larsson, et al. · Plasma Sources Science and Technology · 157

PDF

Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

2006 · J. Alami, P. Eklund, et al. · Thin Solid Films · 131

Spatial electron density distribution in a high-power pulsed magnetron discharge

2005 · J. Bohlmark, J.T. Gudmundsson, et al. · IEEE Transactions on Plasma Science · 121

Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

2010 · M. Lattemann, U. Helmersson, et al. · Thin Solid Films · 115

Guiding the deposition flux in an ionized magnetron discharge

2006 · J. Bohlmark, M. Östbye, et al. · Thin Solid Films · 106

Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering

2009 · Daniel Lundin, Nils Brenning, et al. · Plasma Sources Science and Technology · 95

Investigation and characterisation of silicon nitride and silicon carbide thin films

2003 · M. Lattemann, E. Nold, et al. · Surface and Coatings Technology · 70

Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti–Al–N thin films

2011 · Richard Rachbauer, David Holec, et al. · International Journal of Materials Research (formerly Zeitschrift fuer Metallkunde) · 56

Controlled glow to arc transition in sputtering for high rate deposition of carbon films

2010 · M. Lattemann, B. Abendroth, et al. · Diamond and Related Materials · 49

Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films

2007 · E. Wallin, J.M. Andersson, et al. · Thin Solid Films · 35

Investigation of structure and mechanical properties of magnetron sputtered monolayer and multilayer coatings in the ternary system Si–B–C

2006 · M. Lattemann, S. Ulrich · Surface and Coatings Technology · 31

Nonequilibrium Route to Nanodiamond with Astrophysical Implications

2012 · N. A. Marks, M. Lattemann, et al. · Physical Review Letters · 30

New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition—structural and compositional analysis

2006 · M. Lattemann, S. Ulrich, et al. · Thin Solid Films · 28

Energetic deposition of carbon clusters with preferred orientation using a new mixed mode cathodic arc – Sputtering process

2009 · M. Lattemann, A. Moafi, et al. · Carbon · 25

Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride

2005 · M. Lattemann, K. Sell, et al. · Surface and Coatings Technology · 23

Influence of characteristic properties of PCD grades on the wear development in turning of β-titanium alloy (Ti5Al5V5Mo3Cr)

2019 · M. Ibrahim Sadik, Ernesto Coronel, et al. · Wear · 22

Microstructure Evolution During Spark Plasma Sintering of Metastable (ZrO 2 –3 mol% Y 2 O 3 )–20 wt% Al 2 O 3 Composite Powders

2010 · Jens Suffner, Martina Lattemann, et al. · Journal of the American Ceramic Society · 21

High resolution STEM investigation of interface layers in cemented carbides

2017 · Arno Meingast, Ernesto Coronel, et al. · International Journal of Refractory Metals and Hard Materials · 19

Characterisation of silicon carbide and silicon nitride thin films and Si3N4/SiC multilayers

2002 · M. Lattemann, S. Ulrich, et al. · Diamond and Related Materials · 18

Specific carbide substrate design to enhance tool performance in machining of Ti5553

2018 · M. Ibrahim Sadik, Martina Lattemann, et al. · Procedia CIRP · 16

PDF

High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review

2005 · Ulf Helmersson, Martina Lattemann, et al. · 14

Works count: 68

Citation count: 3,077

H-index: 21

I10-index: 27