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Zuqiang Qi
Observed name:
Qi, Zuqiang
Institution:
FirstUnion (China)
Observed institutions:
The University of Texas at Arlington,
FirstUnion (China)
ORCID:
0009-0004-4430-402X
Observed ORCID:
0009-0004-4430-402X
OpenAlex ID:
A5028133312
XPS study of CMP mechanisms of NiP coating for hard disk drive substrates
2009
·
Zuqiang Qi
, Weiming Lee
·
Tribology International
·
59
A novel design of brush scrubbing in post-CMP cleaning
2014
·
Zuqiang Qi
, Wanjia Lu
, et al.
·
International Journal of Machine Tools and Manufacture
·
33
Wear Mechanism of Nanocrystalline Metals
2009
·
Zuqiang Qi
, Jiechao Jiang
, et al.
·
Journal of Nanoscience and Nanotechnology
·
26
Investigation on Circular Plating Pit of Electroless Ni–P Coating
2014
·
Zuqiang Qi
, Wanjia Lu
, et al.
·
Industrial & Engineering Chemistry Research
·
16
Efficiency analysis of induction heating systems with respect to electromagnetic shielding film's properties
2024
·
Feng Li
, Zuqiang Qi
, et al.
·
Journal of Alloys and Compounds
·
12
A hydrodynamic and kinematic analysis of chemical–mechanical planarization mechanism in double sided polisher
2014
·
Zuqiang Qi
, Wanjia Lu
, et al.
·
International Journal of Machine Tools and Manufacture
·
7
Magnetic shielding properties of an iron-based nanocrystalline alloy for induction heating systems
2024
·
Feng Li
, Ruifeng Zhao
, et al.
·
Heliyon
·
4
Electromagnetic Shielding Properties of Fe-Based Nanocrystalline Alloy for Induction Heating Systems
2024
·
Feng Li
, Ruifeng Zhao
, et al.
·
SSRN Electronic Journal
Electromagnetic Shielding Properties of Fe58.4si16.7b6.5nb5.1cu13.2 Nanocrystalline Alloy
2023
·
Feng Li
, Ruifeng Zhao
, et al.
·
SSRN Electronic Journal
Chemical-Mechanical Polishing of NiP Alloy for Hard Disk Drive Substrates
2009
·
Weiming Lee
, Zuqiang Qi
, et al.
·
Springer eBooks
Chemical-mechanical polishing of Ni-P plated AlMg alloy substrates for high-density perpendicular magnetic recording.
2007
·
Lee, Weiming
, Qi, Zuqiang
, et al.
·
DMG-Lib Digital Mechanism and Gear Library
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Works count:
11
Citation count:
157
H-index:
6
I10-index:
5
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