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Author

Valter Soncini

Observed names: V Soncini, V. Soncini
Institution: Micron (Italy)
OpenAlex ID: A5037684383
Effect of annealing environment on the memory properties of thin oxides with embedded Si nanocrystals obtained by low-energy ion-beam synthesis
2003 · P. Normand, E. Kapetanakis, et al. · Applied Physics Letters · 106
Silicon nanocrystal memory devices obtained by ultra-low-energy ion-beam synthesis
2004 · P Dimitrakis, E Kapetanakis, et al. · Solid-State Electronics · 68
Transient enhanced diffusion of arsenic in silicon
2003 · S. Solmi, M. Ferri, et al. · Journal of Applied Physics · 59
Investigation on indium diffusion in silicon
2002 · S. Solmi, A. Parisini, et al. · Journal of Applied Physics · 52
Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications
2003 · P. Normand, E. Kapetanakis, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 46
MOS memory structures by very-low-energy-implanted Si in thin SiO2
2003 · P. Dimitrakis, E. Kapetanakis, et al. · Materials Science and Engineering B · 41
Effect of ion energy and dose on the positioning of 2D-arrays of Si nanocrystals ion beam synthesised in thin SiO2 layers
2003 · M. Carrada, N. Cherkashin, et al. · Materials Science and Engineering B · 31
Time of flight secondary ion mass spectrometry study of silicon nanoclusters embedded in thin silicon oxide layers
2003 · M. Perego, S. Ferrari, et al. · Applied Physics Letters · 25
Molibdenum contamination in silicon 1. Molibdenum detection by lifetime techniques
1998 · M.L Polignano, C Bresolin, et al. · Materials Science and Engineering B · 17
Effects of annealing conditions on charge storage of Si nanocrystal memory devices obtained by low-energy ion beam synthesis
2003 · P. Normand, E. Kapetanakis, et al. · Microelectronic Engineering · 14
Effect of ion energy and dose on the positioning of 2D-arrays of Si nanocrystals ion beam synthesized in thin SiO2 layers
2003 · M. Carrada, C. Bonafos, et al. · Physica E Low-dimensional Systems and Nanostructures · 12
Contamination by slow diffusers in ion implantation processes: The examples of molybdenum and tungsten
2015 · M.L. Polignano, I. Mica, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 10
Molybdenum Contamination in Indium and Boron Implantation Processes
2007 · Davide Codegoni, Maria Luisa Polignano, et al. · ECS Transactions · 7
Dislocation Generation in Device Fabrication Process
2003 · Isabella Mica, Maria Luisa Polignano, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 7
Laser deposition of YBaCuO single-crystal thin films on different substrates
1992 · M. Bianconi, G. Bobbio, et al. · Materials Science and Engineering B · 7
SiO2 etch rate modification by ion implantation
2012 · E. Bellandi, V. Soncini · Thin Solid Films · 5
Metal contamination reduction in the evolution of ion implantation technology
2002 · M.L. Polignano, D. Caputo, et al. · International Conference on Ion Implantation Technology · 5
ToF‐SIMS depth profiles on Argon‐implanted amorphous carbon. Damage effect and hydrogen characterization
2016 · Salvatore Grasso, Francesco Fumagalli, et al. · Surface and Interface Analysis · 4
Defect generation and suppression in device processes using a shallow trench isolation scheme
2003 · D. Peschiaroli, Massimo Brambilla, et al. · BOA (University of Milano-Bicocca) · 3
Metal contamination monitoring in ion implantation technology
2003 · E. Colelli, A. Galbiati, et al. · International Symposium on Plasma Process-Induced Damage · 2
Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers
2002 · P. Kopalidis, Y. Erokhin, et al. · International Conference on Ion Implantation Technology · 2
Optimization of laser anneal conditions for implanted shallow p/n-junctions
2014 · V. Soncini, I. Mica, et al. · Microelectronic Engineering · 1
Extended defect generation by Xenon implantation in silicon
2014 · I. Mica, M. L. Polignano, et al. · AIP conference proceedings · 1
Defect generation by argon implantation: microscopy characterization and electrical properties
2012 · Isabella Mica, Maria Luisa Polignano, et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 1
PLAsma Doping For P+ Junction Formation In 90 nm NOR Flash Memory Technology
2006 · Dario Bigarella, Valter Soncini, et al. · AIP conference proceedings · 1
Works count: 29
Citation count: 528
H-index: 11
I10-index: 12
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