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Author

Joseph L. Powell

Institution: Lewis University
Observed institution: Lewis University
ORCID: 0000-0002-9882-6411
Observed ORCID: 0000-0002-9882-6411
OpenAlex ID: A5038393789
Survey of Activated Cleaning Chemistries for Low-Stress Post-Chemical Mechanical Planarization Cleaning of Silicon Carbide
2023 · Joseph L. Powell, Jason J. Keleher · ECS Meeting Abstracts · 2
Unraveling the Slurry/Substrate Interfacial Reaction Mechanism for Wide Band Gap (WBG) Chemical Mechanical Planarization (CMP)
2023 · Joseph L. Powell, Ara Philipossian, et al. · ECS Meeting Abstracts
Design of “Soft” Cleaning Processes for Emerging Substrates via Stimuli Responsive Chemistry
2023 · Kiana A. Cahue, Joseph L. Powell, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Development of Responsive Polymeric Nanocomposites for Enhanced CeO2 Removal in Post-Chemical Mechanical Planarization (p-CMP)
2022 · Kun Wu, Adam T. Caridi, et al. · ECS Meeting Abstracts
Coupling Supramolecular Assemblies and Megasonic Energy for Improved p-CMP Cleaning of Silicon Carbide
2022 · Mantas M. Miliauskas, Adam T. Caridi, et al. · ECS Meeting Abstracts
Works count: 5
Citation count: 2
H-index: 1
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