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Author

Rudy J. M. Pellens

Observed names: R. Pellens, Rudy Pellens
Institution: ASML (Netherlands)
OpenAlex ID: A5041920002
Deep-ultraviolet–microelectromechanical systems stencils for high-throughput resistless patterning of mesoscopic structures
2004 · M. A. F. van den Boogaart, G. M. Kim, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 64
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Densely integrated microring resonator based photonic devices for use in access networks
2007 · Edwin J. Klein, Patryk Urban, et al. · Optics Express · 40
Novel aberration monitor for optical lithography
1999 · Peter Dirksen, Casper A. H. Juffermans, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 31
Effect of processing on the overlay performance of a wafer stepper
1997 · Peter Dirksen, Casper A. H. Juffermans, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Front- to back-side overlay optimization after wafer bonding for 3D integration
2006 · Laurent Marinier, Wibo van Noort, et al. · Microelectronic Engineering · 11
Simulations of a Non-planar Lithography and of Performance Characteristics of Arcade Microthermopiles for Energy Scavenging
2007 · Vladimir Leonov, Ziyang Wang, et al. · AIAA International Energy Conversion Engineering Conference (IECEC) · 10
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015 · N. Davydova, R. Kottumakulal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
An mK×nK modular image sensor design
2002 · G. Kreider, J. Bosiers, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 5
Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras
2002 · Y. Jourlin, J. Jay, et al. · Microelectronic Engineering · 3
Densely integrated photonic devices based on microring resonators for use in access networks
2007 · Edwin Klein, Gabariel Sengo, et al. · University of Twente Research Information · 2
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Microelectronics planar technologies for the manufacturing of high spatial frequency gratings: sub-angstroem assessment of spatial coherence
2001 · Olivier M. Parriaux, Y. Jourlin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Focus and exposure dose determination using stepper alignment
1996 · Peter Dirksen, Rudy J. M. Pellens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
EUV Infrastructure: EUV photomask backside cleaning (Conference Presentation)
2017 · Bruce Fender, Dusty Leonhard, et al. · International Conference on Extreme Ultraviolet Lithography
Processdevelopmentonlargetopographymicrostruct Ures Forthermoelectricenergyharvesters
2008 · Juanjuan Su, Ruud Vullers, et al.
High-throughput surface patterning with wafer-sized stencils fabricated by a DUV/MEMS process
2004 · M A F van den Boogaart, G M Kim, et al. · Infoscience (Ecole Polytechnique Fédérale de Lausanne)
Full-wafer stencils fabricated by a DUV/MEMS process for high-throughput patterning of mesoscopic structures
2004 · M A F van den Boogaart, G M Kim, et al. · Infoscience (Ecole Polytechnique Fédérale de Lausanne)
DUV/MEMS based stencils for full-wafer scale, resistless, patterning of mesoscopic structures
2004 · M A F van den Boogaart, G M Kim, et al. · Infoscience (Ecole Polytechnique Fédérale de Lausanne)
Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides
2003 · Rudy J. M. Pellens, Angelique van Klaveren, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime
2003 · Sylvain I. Misat, Rudy J. M. Pellens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 23
Citation count: 190
H-index: 7
I10-index: 6
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