Author

Clement Anyadiegwu

Observed institutions: University of Nigeria, Clariant (United States)

OpenAlex ID: A5041998207

Browning in processed yams: peroxidase or polyphenol oxidase?

2002 · Ferdinand C Chilaka, Sabinus Eze, et al. · Journal of the Science of Food and Agriculture · 22

Development of spin-on-carbon hard mask for advanced node

2014 · Takanori Kudo, M. Dalil Rahman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

New spin-on metal hardmask materials for lithography processes

2013 · Huirong Yao, Salem Mullen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability

2009 · Ruzhi Zhang, Allen G. Timko, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Novel Diamantane Polymer Platform for Resist Applications

2007 · Murirathna Padmanaban, Srinivasan Chakrapani, et al. · Journal of Photopolymer Science and Technology · 6

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Some non-resist component contributions to LER and LWR in 193-nm lithography

2007 · Takanori Kudo, Srinivasan Chakrapani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

PEB sensitivity studies of ArF resist

2003 · SangHo Lee, Woo-Kyu Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

2004 · Seiya Masuda, Masakazu Kobayashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity

2003 · Munirathna Padmanaban, Clement Anyadiegwu, et al. · Journal of Photopolymer Science and Technology · 2

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Novel diamantane polymer platform for enhanced etch resistance

2007 · Munirathna Padmanaban, Srinivasan Chakrapani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Study of the effect of amine additives on LWR and LER

2006 · Francis M. Houlihan, David Rentkiewicz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters

2006 · Francis M. Houlihan, David Rentkiewicz, et al. · Journal of Photopolymer Science and Technology · 1

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PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

2004 · Chi-Sun Hong, Sang-Ho Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

193 nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions with Utilizing FIRM Process

2004 · Keiichi Tanaka, Yoshiaki Yamada, et al. · Journal of Photopolymer Science and Technology · 1

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Versatility in lithographic performance of advanced 193 nm contact hole resist

2006 · Takanori Kudo, Guanyang Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

2006 · M. Dalil Rahman, Srivanisan Chakrapani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Effect of the rinse solution to avoid 193 nm resist line collapse: A study for modification of resist polymer and process conditions

2004 · Seiya Masuda, Masakazu Kobayashi, et al.

Works count: 17

Citation count: 73

H-index: 5

I10-index: 3