Author

Emile Y. Sahouria

Observed names: E. Sahouria, Emile Sahouria

Institution: Mentor Graphics (United States)

Observed institutions: Mentor Graphics (United States), University of California, Berkeley

OpenAlex ID: A5048087015

Content analysis of video using principal components

1999 · E. Sahouria, A. Zakhor · IEEE Transactions on Circuits and Systems for Video Technology · 110

Advanced mask process modeling for 45-nm and 32-nm nodes

2008 · Edita Tejnil, Yuanfang Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Full-chip Process Simulation for Silicon DRC

2000 · Nicolas B. Cobb, Yuri Granik, et al. · TechConnect Briefs · 12

Assessment and comparison of different approaches for mask write time reduction

2011 · A. Elayat, T. Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Full-chip-model-based correction of flare-induced linewidth variation

2004 · James Word V, Jerome Belledent, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Reducing shot count through optimization-based fracture

2011 · Timothy Lin, Emile Sahouria, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Generalization of shot definition for variable shaped e-beam machines for write time reduction

2010 · Emile Sahouria, Amanda Bowhill · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Pattern based mask process correction: impact on data quality and mask writing time

2005 · Emile Sahouria, Amanda Bowhill, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

1999 · Chris A. Spence, Marina V. Plat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp

2008 · Alexander Tritchkov, Petr Glotov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Efficient full-chip yield analysis methodology for OPC-corrected VLSI designs

2002 · V. Axelrad, N. Cobb, et al. · International Symposium on Quality Electronic Design (ISQED) · 6

Phase aware proximity correction for advanced masks

2000 · Olivier Toublan, Emile Y. Sahouria, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Benchmarking of mask fracturing heuristics

2014 · Tuck Boon Chan, Puneet Gupta, et al. · 5

High-performance fracturing for variable shaped beam mask writing machines

2003 · Steffen F. Schulze, Emile Y. Sahouria, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Mask shot count reduction strategies in the OPC flow

2008 · James Word, Keisuke Mizuuchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

2005 · Steffen Schulze, Emile Sahouria · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow

2003 · Steffen F. Schulze, Emile Sahouria, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Fully automatic side lobe detection and correction technique for attenuated phase-shift masks

2001 · Olivier Toublan, Nicolas B. Cobb, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation

2000 · Yuri Granik, Nicolas B. Cobb, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Benchmarking of mask fracturing heuristics

2014 · Tuck Boon Chan, Puneet Gupta, et al. · International Conference on Computer Aided Design · 3

Compute resource management and turn around time control in mask data prep

2008 · Travis Lewis, Scott Goad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

OASIS-based unification of mask data representation

2004 · Emile Y. Sahouria, Steffen F. Schulze · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Hierarchical GDSII-based fracturing and job deck system

2002 · Nicolas B. Cobb, Emile Y. Sahouria · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

2009 · Suheil Zaatri, Yan Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Reduction of layout complexity for shorter mask write-time

2007 · Sean Hannon, Travis Lewis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Works count: 41

Citation count: 264

H-index: 8

I10-index: 6