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Steve Hansen
Institution:
ASML (United States)
Observed institutions:
ASML (United States),
ASML (Netherlands)
OpenAlex ID:
A5051103450
EUV simulation extension study for mask shadowing effect and its correction
2008
·
Hoyoung Kang
, Steve Hansen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
43
EUV resolution enhancement techniques (RETs) for k10.4 and below
2015
·
Stephen Hsu
, Rafael Howell
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
28
Enabling the 45nm node by hyper-NA polarized lithography
2006
·
Wim de Boeij
, Geert Swinkels
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Optical lithography in the sub-50-nm regime
2004
·
Donis G. Flagello
, Bill Arnold
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
PDF
Accurate models for EUV lithography
2009
·
Eric Hendrickx
, Gian F. Lorusso
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Imaging solutions for the 22nm node using 1.35NA
2009
·
André Engelen
, Melchior Mulder
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Photoresist induced contrast loss and its impact on EUV imaging extendibility
2008
·
Koen van Ingen Schenau
, Steve Hansen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Imaging budgets for EUV optics: ready for 22-nm node and beyond
2009
·
Marc Bienert
, Aksel Göhnemeier
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
The contact hole solutions for future logic technology nodes
2007
·
Alek Chen
, Steve Hansen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
2005
·
Bernd Geh
, Donis G. Flagello
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Process transfer strategies between ASML immersion scanners
2009
·
Yuan He
, Peter Engblom
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
The random contact hole solutions for future technology nodes
2007
·
Alek Chen
, Steve Hansen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
2004
·
ChangAn Wang
, Guohong Zhang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
How to obtain accurate resist simulations in very low-k1 era?
2006
·
Tsann-Bim Chiou
, Chan-Ha Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Precision process calibration and CD predictions for low-k 1 lithography
2005
·
Ting Chen
, Sangbong Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
A Two-Dimensional, Time-Gated X-ray/EUV Imaging Spectrometer
1999
·
V. L. Kantsyrev
, B. S. Bauer
, et al.
·
APS
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Works count:
16
Citation count:
119
H-index:
5
I10-index:
4
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