Work

Precision process calibration and CD predictions for low-k 1 lithography

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.617218

Authors: Ting Chen, Sangbong Park, Gabriel Berger, Tamer H. Coskun, Joep de Vocht, Fung Chen, Linda Yu, Stephen Hsu, Doug van den Broeke, Robert Socha, Jungchul Park, Keith Gronlund, Todd Davis, Vince Plachecki, Tom Harris, Steve Hansen, Chuck Lambson

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2082315744

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