Author

Fung Chen

Observed institutions: ASML (United States), ASML (Netherlands)

OpenAlex ID: A5111664545

Experimental verification of a model-based decomposition method for double dipole lithography

2004 · Mark Eurlings, Stephen D. Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

The application of CPL reticle technology for the 0.045-mm node

2004 · Will Conley, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination

2006 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations

2005 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Precision process calibration and CD predictions for low-k 1 lithography

2005 · Ting Chen, Sangbong Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 5

Citation count: 4

H-index: 1

I10-index: