The application of CPL reticle technology for the 0.045-mm node
Year: 2004
Type: conference-paper
DOI: 10.1117/12.537613
Authors: Will Conley, Douglas J. Van Den Broeke, Robert J. Socha, Wei Wu, Lloyd C. Litt, Kevin D. Lucas, Bernard J. Roman, Richard D. Peters, Colita Parker, Fung Chen, Kurt E. Wampler, Thomas L. Laidig, Erika Schaefer, Jan-Pieter Kuijten, Arjan Verhappen, Stephan van de Goor, Martin Chaplin, Bryan S. Kasprowicz, Christopher J. Progler, Emilien Robert, Philippe Thony
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2013331817