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Lloyd C. Litt

Observed names: L. C. Litt, L. Litt, L.C. Litt, Lloyd C. Litt, Lloyd Litt
OpenAlex ID: A5069752016
Manufacturing considerations for implementation of scatterometry for process monitoring
2000 · John A. Allgair, David C. Benoit, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Step and flash imprint lithography for semiconductor high volume manufacturing?
2010 · M. Malloy, L. C. Litt · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Cost of ownership for future lithography technologies
2008 · Andrew J. Hazelton, Andrea Wüest, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Impact of flare on CD variation for 248-nm and 193-nm lithography systems
2001 · Anatoly Bourov, Lloyd C. Litt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Flare and its impact on low-k 1 KrF and ArF lithography
2002 · Bruno M. La Fontaine, Mircea V. Dusa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
SEMATECH's nanoImprint program: a key enabler for nanoimprint introduction
2009 · Lloyd C. Litt, Matt Malloy · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes
2008 · Greg Hughes, Lloyd C. Litt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
ArF solutions for low-k 1 back-end imaging
2003 · Vincent Wiaux, Patrick K. Montgomery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Jet and flash imprint defectivity: assessment and reduction for semiconductor applications
2011 · Matt Malloy, Lloyd C. Litt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology
2006 · Eric Poortinga, Axel Zibold, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization
2001 · John A. Allgair, David C. Benoit, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Step and Flash Imprint Lithography for Semiconductor High Volume Manufacturing
2010 · M. Malloy, L. C. Litt · Journal of Photopolymer Science and Technology · 6
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RET integration of CPL technology for random logic
2004 · Stephen D. Hsu, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Applications of CPL mask technology for sub-65nm gate imaging
2005 · Lloyd C. Litt, Will Conley, et al. · Optical Microlithography XVIII · 4
High transmission mask technology for 45nm node imaging
2005 · Will Conley, Mike Cangemi, et al. · Optical Microlithography XVIII · 4
Mighty high-T lithography for 65-nm generation contacts
2003 · Will Conley, Patrick K. Montgomery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Application of CPL reticle technology for the 65- and 50-nm node
2003 · Will Conley, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Evaluation and characterization of flare in ArF lithography
2002 · Lloyd C. Litt, Anatoly Bourov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Full-field CD control for sub-0.20-μm patterning
1997 · John L. Sturtevant, John A. Allgair, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Effect of mask 3D and scanner focus difference on OPC modeling and verification
2014 · GuoXiang Ning, Jacky Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Multiple beam mask writers: an industry solution to the write time crisis
2010 · Lloyd C. Litt · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
A study of template cleaning for nano-imprint lithography
2007 · James E. Ellenson, Lloyd C. Litt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Application of Chromeless Phase Lithography (CPL) masks in ArF lithography
2002 · Bryan S. Kasprowicz, Christopher J. Progler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Model-based design improvements for the 100-nm lithography generation
2002 · Kevin Lucas, Sergei V. Postnikov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Characterization of CD control for sub-0.18-μm lithographic patterning
1999 · John L. Sturtevant, John A. Allgair, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Works count: 62
Citation count: 205
H-index: 8
I10-index: 6
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