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Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.633465

Authors: Ting Chen, Doug Van Den Broeke, Stephen Hsu, Michael Hsu, Sangbong Park, Gabriel Berger, Tamer Coskun, Joep de Vocht, Fung Chen, Robert Socha, JungChul Park, Keith Gronlund

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017540184

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