Author

Gabriel Berger

Institution: Mentor Graphics (United States)

Observed institutions: ASML (United States), Mentor Graphics (United States)

OpenAlex ID: A5084594633

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

2010 · David Melville, Alan E. Rosenbluth, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23

Applicability of global source mask optimization to 22/20nm node and beyond

2011 · Kehan Tian, Moutaz Fakhry, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Pattern specific optical models

2008 · Edita Tejnil, Konstantinos Adam, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1

A single-exposure approach for patterning 45nm flash/DRAM contact hole mask

2006 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination

2006 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations

2005 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Precision process calibration and CD predictions for low-k 1 lithography

2005 · Ting Chen, Sangbong Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 7

Citation count: 33

H-index: 2

I10-index: 1