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Jungchul Park

Observed name: JungChul Park
OpenAlex ID: A5083004156
Application challenges with double patterning technology (DPT) beyond 45 nm
2006 · Jungchul Park, Stephen Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37
Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach
2009 · Jie Li, Zhuan Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Dark field double dipole lithography (DDL) for back-end-of-line processes
2007 · M. Burkhardt, Sean Burns, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Dark field Double Dipole Lithography (DDL) for 45nm node and beyond
2006 · Stephen Hsu, Martin Burkhardt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations
2005 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 5
Citation count: 63
H-index: 4
I10-index: 2
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