Work

Dark field Double Dipole Lithography (DDL) for 45nm node and beyond

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.681854

Authors: Stephen Hsu, Martin Burkhardt, Jungchul Park, Douglas Van Den Broeke, J. Fung Chen

Institutions: ASML (United States), ASML (Netherlands), IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1968435728

FWCI: 1.583

Cites:

Cited by: 5

Related to: 10