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Martin J. J. Jak
Observed names:
Jak, M,
Jak, M.J.J.,
M. J. J. Jak,
M. Jak,
M.J.J Jak,
M.J.J. Jak,
Martin J. Jak,
Martin Jak
show all 8
Institution:
ASML (Netherlands)
Observed institutions:
Institute for Atomic and Molecular Physics,
Philips (Netherlands),
Signify (Netherlands),
ASML (Netherlands)
OpenAlex ID:
A5063760461
Scanning tunnelling microscopy study of the growth of small palladium particles on TiO2(110)
2000
·
M.J.J. Jak
, C. Konstapel
, et al.
·
Surface Science
·
98
The influence of substrate defects on the growth rate of palladium nanoparticles on a TiO2(110) surface
2001
·
M.J.J. Jak
, C. Konstapel
, et al.
·
Surface Science
·
58
Evaluation of a novel ultra small target technology supporting on-product overlay measurements
2012
·
Henk-Jan H. Smilde
, Arie den Boef
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
41
On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections
2013
·
Kaustuve Bhattacharyya
, Chih-Ming Ke
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
28
Extreme ultraviolet multilayer mirror with near-zero IR reflectance
2009
·
W. A. Soer
, P. Gawlitza
, et al.
·
Optics Letters
·
27
Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources
2009
·
Wouter A. Soer
, Martin J. J. Jak
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
26
Short period holographic structures for backlight display applications
2007
·
Roberto Caputo
, Luciano De Sio
, et al.
·
Optics Express
·
25
Automated detection of particles, clusters and islands in scanning probe microscopy images
2001
·
M.J.J. Jak
, C. Konstapel
, et al.
·
Surface Science
·
25
Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho
2015
·
Kaustuve Bhattacharyya
, Arie den Boef
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
20
A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection
2017
·
Kaustuve Bhattacharyya
, Arie den Boef
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors
2012
·
Wouter A. Soer
, Maarten M. van Herpen
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
16
The effect of stoichiometry on the stability of steps on TiO2(1 1 0)
2002
·
M.J.J Jak
, A van Kreuningen
, et al.
·
Applied Surface Science
·
13
Color‐separating backlight for improved LCD efficiency
2008
·
Martin J. J. Jak
, Robert Caputo
, et al.
·
Journal of the Society for Information Display
·
10
Diffractive grating structures for colour-separating backlights
2006
·
Dick K. G. de Boer
, Roberto Caputo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Hybrid spatial‐temporal color synthesis and its applications
2005
·
Louis D. Silverstein
, Sander J. Roosendaal
, et al.
·
Journal of the Society for Information Display
·
8
New approaches in diffraction based optical metrology
2016
·
M. Ebert
, P. Vanoppen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness
2013
·
Henk-Jan H. Smilde
, Martin Jak
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
25.3: Spectrum Sequential Liquid Crystal Display
2005
·
M. J. J. Jak
, G. J. Hekstra
, et al.
·
SID Symposium Digest of Technical Papers
·
6
Reducing the overlay metrology sensitivity to perturbations of the measurement stack
2017
·
Yue Zhou
, DeNeil Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
DLC/Si multilayer mirrors for EUV radiation
2010
·
Peter Gawlitza
, Stefan Braun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Ion mitigation in SN-based EUV sources using a magnetic field
2008
·
Soer, WJ Willem Jan
, Gielissen, K Kurt
, et al.
·
TU/e Research Portal
Ontwerpen en testen van een Kerr-effect meetopstelling
1994
·
Jak, M.J.J.
, Wormeester, Herbert
·
University of Twente Research Information
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Works count:
22
Citation count:
449
H-index:
12
I10-index:
14
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