Author

Jy K. Bhardwaj

Observed names: J. Bhardwaj, J. K. BHARDWAJ, J. K. Bhardwaj, J.K. Bhardwaj, Jy Bhardwaj

Observed institutions: University of Liverpool, Photonics Bretagne (France), JDSU (United States)

OpenAlex ID: A5064275502

Advanced silicon etching using high-density plasmas

1995 · Jy K. Bhardwaj, Huma Ashraf · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 234

Recent advances in silicon etching for MEMS using the ASE™ process

1999 · A.M. Hynes, H. Ashraf, et al. · Sensors and Actuators A Physical · 180

Progress in high-luminance LED technology for solid-state lighting

2017 · Jy Bhardwaj, John M. Cesaratto, et al. · physica status solidi (a) · 41

The Benefits of Process Parameter Ramping During The Plasma Etching of High Aspect Ratio Silicon Structures

1998 · J. Hopkins, H. Ashraf, et al. · MRS Proceedings · 33

Etching 200-mm diameter SCALPEL masks with the ASE process

2000 · Ian R. Johnston, Huma Ashraf, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Advances in LEDs for automotive applications

2016 · Jy Bhardwaj, Rao Peddada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Advances in Deep Anisotropic Silicon Etch Processing for Mems

2000 · H. ASHRAF, J. K. BHARDWAJ, et al. · Sensors and Microsystems · 9

Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks

2001 · W.J. Dauksher, S.B. Clemens, et al. · Microelectronic Engineering · 7

Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor

1999 · H. Ashraf, J. K. Bhardwaj, et al. · MRS Proceedings · 7

Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication

2001 · W. J. Dauksher, S. B. Clemens, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

What will mainstream adaptive driving beam look like by 2025?

2019 · Jy Bhardwaj, Benno Spinger · Light-Emitting Devices, Materials, and Applications · 5

High Etch Rate Gallium Nitride Processing Using an Inductively Coupled Plasma Source

1999 · M. E. Ryan, A. C. Camacho, et al. · physica status solidi (a) · 5

Advances in Deep Oxide Etch Processing for Mems – Mask Selection

2000 · J. K. BHARDWAJ, C. WELCH, et al. · Sensors and Microsystems · 4

Photographic studies of the discharge development in a low-trigger-voltage vacuum switch

1988 · J.K. Bhardwaj, P.A. Chatterton · IEEE Transactions on Electrical Insulation · 4

Advances in PLC Technology for DWDM Applications

2006 · B. Fondeur, R. Brainard, et al. · European Conference on Optical Communication · 3

Progress in LED technology for solid-state lighting

2017 · Jy Bhardwaj, Greg Guth, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Advanced LED technology for automotive applications

2016 · Jy Bhardwaj, Rao Peddada, et al. · SPIE Newsroom · 2

Advanced arrayed-waveguide gratings and integrated optical devices

2006 · Bart Fondeur, Bob Brainard, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

III–V dry processing from R&D to production

1990 · Jy Bhardwaj · Euro III-Vs Review

Works count: 19

Citation count: 561

H-index: 7

I10-index: 5