Author

Steven Dzioba

Observed names: Dzioba, Steven, S. DZIOBA, S. Dzioba

Observed institutions: Nortel (Canada), Bell (Canada), IBM Research - Thomas J. Watson Research Center, McMaster University

OpenAlex ID: A5068464369

Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas

1982 · Steven Dzioba, G. Este, et al. · Journal of The Electrochemical Society · 59

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On the kinetic energies of sputtered excited particles, I. Atoms sputtered from Li, LiF, and NaCl

1980 · Steven Dzioba, Orlando Auciello, et al. · Radiation Effects · 47

Temperature measurements of glass substrates during plasma etching

1981 · R. A. Bond, S. Dzioba, et al. · Journal of Vacuum Science and Technology · 46

On the kinetic energies of sputtered excited particles

1980 · Steven Dzioba, Roger Kelly · Surface Science · 40

Recoil implantation from a thin source

1978 · Steven Dzioba, Roger Kelly · Journal of Nuclear Materials · 30

Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics

1994 · Steven Dzioba, R. Rousina · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 29

Atomic, molecular, and continuum radiation from ion-bombarded B and B2O3

1981 · R. Kelly, S. Dzioba, et al. · Surface Science · 27

High temperature operation of InGaAsP/InP heterostructure lasers and integrated back facet monitors fabricated by chemically assisted ion beam etching

1993 · Steven Dzioba, S. Jatar, et al. · Applied Physics Letters · 21

Strongly gain-coupled (SGC) coolerless (-40°C∼+85°C) MQW DFB lasers

1999 · J. Hong, C. Blaauw, et al. · IEEE Journal of Selected Topics in Quantum Electronics · 20

On the kinetic energies of sputtered excited particles

1981 · Steven Dzioba, Roger Kelly · Nuclear Instruments and Methods · 17

CVD-SiO2 and plasma-SiNx films as Zn diffusion masks for GaAs

1984 · C. Blaauw, A. J. SpringThorpe, et al. · Journal of Electronic Materials · 14

On the surface-normal energy distribution of sputtered recoils

1979 · G. Carter, G. Fischer, et al. · Radiation Effects · 14

Downstream Plasma Induced Deposition of SiN x on Si, InP , and InGaAs

1987 · Steven Dzioba, S. Meikle, et al. · Journal of The Electrochemical Society · 11

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Optical spectroscopy during reactive ion beam etching of Si and Al targets

1982 · Steven Dzioba, H. M. Naguib · Journal of Applied Physics · 10

On the problem of whether the transition probability plays a role in describing secondary-photon yields

1980 · M.R. Morrow, O. Auciello, et al. · Surface Science · 10

Wafer scale processing of InGaAsP/InP lasers

1994 · Steven Dzioba, J. P. D. Cook, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4

ECR Plasma Deposition of Dielectrics for Optoelectronic Applications

1989 · Steven Dzioba · MRS Proceedings · 2

Long-wavelength ridge-wave-guide lasers with processed facets and integrated back-facet monitors

1992 · J. P. D. Cook, S. Dzioba, et al. · Canadian Journal of Physics · 1

Reactive Ion Etching of GaAs and Related III-V Compounds

1986 · Steven Dzioba · Springer eBooks · 1

On the kinetic energies of sputtered excited particles

1980 · Steven Dzioba, Roger Kelly · Surface Science Letters · 1

ECR CVD of silicon oxynitride films for antireflection coating of 10 Gbit/s, 1.56 μm multi-quantum well InP/InGaAsP Mach-Zehnder modulators

2002 · R. Rousina-Webb, S. Dzioba, et al. · Conference proceedings. ... International Conference on Indium Phosphide and Related Materials

ChemInform Abstract: Downstream Plasma Induced Deposition of SiNx on Si, InP, and InGaAs.

1988 · S. DZIOBA, S. MEIKLE, et al. · ChemInform