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Diane C. McCafferty
Observed name:
Diane McCafferty
Institutions:
ASML (United States),
ASML (Netherlands)
Observed institutions:
ASML (United States),
ASML (Netherlands)
OpenAlex ID:
A5069003759
Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k1 of 0.25
2005
·
Roger H. French
, Harry Sewell
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
32
32nm node technology development using interference immersion lithography
2005
·
Harry Sewell
, Diane McCafferty
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Extending immersion lithography with high-index materials: results of a feasibility study
2007
·
Harry Sewell
, Jan Mulkens
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
The next phase for immersion lithography
2006
·
Harry Sewell
, Jan Mulkens
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
High-n immersion lithography
2008
·
Harry Sewell
, Jan Mulkens
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
An Update on the Progress in High-n Immersion Lithography
2008
·
Harry Sewell
, Paul Graeupner
, et al.
·
Journal of Photopolymer Science and Technology
·
5
PDF
Extending immersion lithography with high index materials Results of a feasibility study - art. no. 65201M
2007
·
Harry Sewell
, Jan Mulkens
, et al.
·
5
Optical Lithography for the 32nm Node
2005
·
Harry Sewell
, Diane McCafferty
, et al.
·
Journal of Photopolymer Science and Technology
·
5
PDF
Current Status of High-n Immersion Lithography Development
2007
·
Harry Sewell
, Jan Mulkens
, et al.
·
Journal of Photopolymer Science and Technology
·
4
PDF
157-nm Micrascan VII initial lithography results
2003
·
Harry Sewell
, Bruce A. Tirri
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool
1997
·
Daniel R. Cote
, Keith W. Andresen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Advancing Immersion Lithography
2006
·
Harry Sewell
, Jan Mulkens
, et al.
·
Journal of Photopolymer Science and Technology
·
1
PDF
Full-field imaging with a 157-nm scanner
2004
·
Chris Robinson
, Nakgeuon Seong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Evaluation of SCAA mask technology as a pathway to the 65-nm node
2003
·
James V. Beach
, John S. Petersen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system
2002
·
Harry Sewell
, Pankaj Raval
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Evaluation of the dual exposure technique
2001
·
Harry Sewell
, Victor F. Bunze
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Benchmarking multimode CD-SEM metrology to 180 nm
1996
·
Kevin M. Monahan
, Farid Askary
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
17
Citation count:
97
H-index:
5
I10-index:
4
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