Author

Danping Peng

Observed institutions: Taiwan Semiconductor Manufacturing Company (United States), University of California, Los Angeles, Taiwan Semiconductor Manufacturing Company (Taiwan)

OpenAlex ID: A5069829342

A PDE-Based Fast Local Level Set Method

1999 · Danping Peng, Barry Merriman, et al. · Journal of Computational Physics · 1,287

Weighted ENO Schemes for Hamilton--Jacobi Equations

2000 · Guang-Shan Jiang, Danping Peng · SIAM Journal on Scientific Computing · 1,156

Toward a consistent and accurate approach to modeling projection optics

2010 · Danping Peng, Peter Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 47

Level-Set-Based Deformation Methods for Adaptive Grids

2000 · Guojun Liao, Feng Liu, et al. · Journal of Computational Physics · 47

Validation of inverse lithography technology (ILT) and its adaptive SRAF at advanced technology nodes

2008 · Linyong Pang, Grace Dai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 39

The geometry of Wulff crystal shapes and its relations with Riemann problems

1999 · Danping Peng, Stanley Osher, et al. · Contemporary mathematics - American Mathematical Society · 30

Source-mask co-optimization (SMO) using level set methods

2009 · Vikram Tolani, Peter Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

2009 · Linyong Pang, Peter Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Advances in Inverse Lithography

2022 · Thomas Cecil, Danping Peng, et al. · ACS Photonics · 19

EUV multilayer defect compensation (MDC) by absorber pattern modification, film deposition, and multilayer peeling techniques

2013 · Linyong (Leo) Pang, Masaki Satake, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

2010 · Linyong Pang, Danping Peng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification

2011 · Linyong Leo Pang, Chris Clifford, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Lithographic plane review (LPR) for sub-32nm mask defect disposition

2010 · Vikram Tolani, Danping Peng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Compensation methods using a new model for buried defects in extreme ultraviolet lithography masks

2010 · Chris H. Clifford, Tina T. Chan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair

2012 · Linyong Pang, Danping Peng, et al. · Advanced Optical Technologies · 11

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

2009 · Jin-Hyung Park, Paul D. H. Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation

2011 · Linyong Pang, Peter Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Mask defect auto disposition based on aerial image in mask product

2009 · C. Y. Chen, Laurent Tuo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

AIMS D2DB simulation for DUV and EUV mask inspection

2012 · Danping Peng, Ying Li, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

A fast approach to model EUV mask 3D and shadowing effects

2012 · Ying Li, Danping Peng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Computational lithography and inspection (CLI) and its applications in mask inspection, metrology, review, and repair

2010 · Linyong Pang, Danping Peng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Computational defect review for actinic mask inspections

2013 · Paul Morgan, Daniel Rost, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

EUV mask absorber and multi-layer defect disposition techniques using computational lithography

2011 · Vikram Tolani, Masaki Satake, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Defect printability comparing actinic printing with advanced simulation for EUV masks

2013 · Il-Yong Jang, Ranganath Teki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses

2012 · Linyong Pang, Masaki Satake, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Works count: 46

Citation count: 2,836

H-index: 13

I10-index: 16