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Author

Shingo Asaumi

Observed names: S. Asaumi, Shingo ASAUMI, 浅海, 愼五
Observed institution: Tokyo Ohka Kogyo (Japan)
OpenAlex ID: A5070465477
Mechanism of Photoresist Resolution Improvement by Pre‐exposure Treatment
1990 · Shingo Asaumi, Hisashi Nakane · Journal of The Electrochemical Society · 6
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Developmental Characteristics of Exposed Positive Photoresists
1992 · Shingo Asaumi, Mitsuhiro Furuta · Journal of The Electrochemical Society · 4
Analysis of High Resolution Mechanism of Postitive Photoresists.
1994 · Akira YOKOTA, Masataka NISHIDA, et al. · KOBUNSHI RONBUNSHU · 3
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Reduction of Metal Impurities in Positive Photoresists.
1991 · S. Asaumi, T. Nakayama, et al. · Journal of Photopolymer Science and Technology · 3
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The high resolution resists.
1984 · Hisashi NAKANE, Akira YOKOTA, et al. · Journal of Synthetic Organic Chemistry Japan · 2
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Limitation of removal particles in positive photoresist
1992 · Shingo Asaumi, Mitsuhiro Furuta, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Mechanism of dissolution inhibition of novolak-diazoquinone resist
1991 · Mitsuhiro Furuta, Shingo Asaumi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Influence of Casting Solvents on the Properties of Positive Photoresists.
1996 · Shingo ASAUMI, Hidekatsu KOHARA, et al. · KOBUNSHI RONBUNSHU
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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Trend of High Resolution for Positive Photoresists.
1993 · Shingo ASAUMI, Tetsuya OSAKA · Journal of The Surface Finishing Society of Japan
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Variation in the surface layer of a prebaked positive photoresist.
1990 · Shingo ASAUMI, Mitsuhiro FURUTA · KOBUNSHI RONBUNSHU
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High Resolution Positive Photoresist For Submicron Photolithography
1987 · Hidekatsu Kohara, Hatsuyuki Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Photolithography for micro-electronics.
1986 · Shingo Asaumi · Kobunshi
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Untitled
1984 · Yoichi NAKAMURA, Shirushi YAMAMOTO, et al. · NIPPON KAGAKU KAISHI
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Recent Development and Progress on Photoresist Technology
1977 · Akira Yokota, Shingo Asaumi · The Journal of The Institute of Image Information and Television Engineers
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Works count: 15
Citation count: 20
H-index: 3
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