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Thomas P. Coleman

Observed names: T Coleman, T. Coleman
OpenAlex ID: A5071063183
180-nm mask fabrication process using ZEP 7000, multipass gray, GHOST, and dry etch for MEBES 5000
1998 · Maiying Lu, Thomas P. Coleman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Plasma etching of Cr films in the fabrication of photomasks: II. a comparison of etch technologies and a first look at defects
1996 · Thomas P. Coleman, Peter D. Buck, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist
1998 · Frederick T. Chen, Wilman Tsai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions
1997 · Chris Constantine, David J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Plasma etching of Cr photomasks: optimization of process conditions and CD control
1997 · Chris Constantine, David J. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Plasma etching of chromium films in the fabrication of photomasks
1995 · Thomas P. Coleman, Peter D. Buck · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Comparison of EBR-900 M1 and ZEP 7000 with plasma-etch processing for MEBES 4500S
1997 · Thomas P. Coleman, David W. Alexander, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Control methodology of off-target for varying pattern densities with chrome dry etch
1999 · Juergen Hochmuth, Guenther G. Ruhl, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Investigation of lithography performance using multipass gray (MPG) with MEBES 5000
1999 · Robert L. Dean, David W. Alexander, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
1996 · Frank E. Abboud, David W. Alexander, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Lithography and CD performance of advanced MEBES mask pattern generators
2000 · Jan M. Chabala, Damon M. Cole, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Performance of the ALTA 3500 scanned-laser mask lithography system
1998 · Peter D. Buck, Alex H. Buxbaum, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Further advances in electron-beam pattern generation technology for 180-nm masks
1998 · Frank E. Abboud, Charles A. Sauer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference
1995 · Jim DeWitt, Joe Watson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Alta◇3500 走査-レーザ マスク リソグラフィー システムの性能
1998 · P Buck, A Buxbaum, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
ZEP7000、マルチパスグレイ、GHOST、およびMEBES5000用のドライエッチを用いた180nmマスク製造
1998 · Lu Mei, T Coleman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules
1995 · Thomas P. Coleman, Charles A. Sauer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 17
Citation count: 51
H-index: 5
I10-index: 1
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