Work

Performance of the ALTA 3500 scanned-laser mask lithography system

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.328807

Authors: Peter D. Buck, Alex H. Buxbaum, Thomas P. Coleman, Long Tran

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016153942

FWCI:

Cites:

Cited by: 1

Related to: 10