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Gaël Borvon
Observed names:
Borvon, G.,
Borvon, Gael,
G Borvon,
G. Borvon,
Gael Borvon
Institution:
Ibs (France)
Observed institutions:
Centre National de la Recherche Scientifique,
Institut des Matériaux Jean Rouxel,
Laboratoire des Technologies de la Microélectronique,
Ibs (France),
Laboratoire d'Électronique des Technologies de l'Information,
Université de Nantes,
Nantes Université
show all 7
OpenAlex ID:
A5072339290
Analysis of Low-k Organosilicon and Low-Density Silica Films Deposited in HMDSO Plasmas
2002
·
G. Borvon
, A. Goullet
, et al.
·
Plasmas and Polymers
·
38
Efficient and low-damage nitrogen doping of graphene via plasma-based methods
2015
·
Yu-Pu Lin
, Younal Ksari
, et al.
·
Carbon
·
31
Electrical properties of low-dielectric-constant films prepared by PECVD in O2/CH4/HMDSO
2002
·
G Borvon
, A Goullet
, et al.
·
Materials Science in Semiconductor Processing
·
25
Mechanisms Involved in the Conversion of ppHMDSO Films into SiO2‐Like by Oxygen Plasma Treatment
2006
·
Agnès Granier
, Gael Borvon
, et al.
·
Plasma Processes and Polymers
·
24
Effect of the ion bombardment energy on silicon dioxide films deposited from oxygen/tetraethoxysilane plasmas in a helicon reactor
2004
·
D. Goghero
, A. Goullet
, et al.
·
Thin Solid Films
·
12
Poly-Si/SiOx Passivating Contacts on Both Sides: A Versatile Technology For High Efficiency Solar Cells
2021
·
Thibaut Desrues
, Adeline Lanterne
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
10
The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD
2004
·
A. Mackova
, V. Perina
, et al.
·
Surface Science
·
8
Hydrogenation of sputtered ZnO:Al layers for double side poly-Si/SiOx solar cells
2022
·
Charles Seron
, Thibaut Desrues
, et al.
·
EPJ Photovoltaics
·
5
PDF
Recent developments on PULSION® PIII tool: FinFET 3D doping, high temp implantation, III-V doping, contact and silicide improvement, & 450 mm
2015
·
Frank Torregrosa
, Yohann Spiegel
, et al.
·
International Workshop on Junction Technology
·
2
Implantation and metrology solutions for low energy boron implant on 450mm wafers
2014
·
A-S. Robbes
, K-A B-T. Meura
, et al.
·
International Conference on Ion Implantation Technology
·
2
Strain Modification of PECVD Nitride By Plasma Immersion Ion Implantation Processes
2020
·
Laurent Lachal
, Christophe Plantier
, et al.
·
ECS Transactions
·
1
PDF
Nitride stress inversion using plasma immersion ion implantation processes
2023
·
L. Lachal
, C. Plantier
, et al.
·
MRS Advances
Ex-situ Hydrogenation of Sputtered Transparent Conductive Oxide layers by Plasma Immersion Ion Implantation
2020
·
Charles Seron
, Thibaut Desrues
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
Strain Modification of PECVD Nitride By Plasma Immersion Ion Implantation Processes
2020
·
Laurent Lachal
, Christophe Plantier
, et al.
·
ECS Meeting Abstracts
Functionalized Oxides for Bifacial Solar Cells with Passivated Contacts: First Results of the OXYGEN Project
2019
·
Desrues, Thibaut
, Morisset, Audrey
, et al.
·
HAL
Advantages and Challenges of Plasma Immersion Ion Implantation for Power Devices Manufacturing on Si, SiC and GaN using PULSION® Tool
2018
·
Frank Torregrosa
, Yohann Spiegel
, et al.
·
International Conference on Ion Implantation Technology
Study of AsH3 Plasma Immersion Ion Implantation using PULSION®
2014
·
Julian Duchaine
, Frank Torregrosa
, et al.
·
International Conference on Ion Implantation Technology
Front Cover: Plasma Process. Polym. 4‐5/2006
2006
·
Agnès Granier
, Gael Borvon
, et al.
·
Plasma Processes and Polymers
PDF
Etching of HfO2 and HfSiOx ay elevated temperatures
2004
·
Helot, M.
, Borvon, G.
, et al.
·
HAL
Mechanisms involved in the transformation of ppHMDSO films into SiO2-like by oxygen plasma treatment
2003
·
Borvon, G.
, Bousquet, Angelique
, et al.
·
HAL
Élaboration par plasma d'hexaméthyldisiloxane de couches minces à faible constante diélectrique pour applications aux interconnexions en CMOS
2003
·
Gaël Borvon
·
OpenGrey (Institut de l'Information Scientifique et Technique)
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Works count:
23
Citation count:
160
H-index:
7
I10-index:
6
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