Author

Touko Lehenkari

Observed name: Lehenkari, Touko

Institutions: Infotech Oulu, University of Oulu

Observed institutions: Infotech Oulu, University of Oulu

ORCID: 0009-0007-2596-7030

Observed ORCID: 0009-0007-2596-7030

OpenAlex ID: A5075980397

Evidence of defect formation in monolayer MoS 2 at ultralow accelerating voltage electron irradiation

2023 · Ajit Kumar Dash, Hariharan Swaminathan, et al. · 2D Materials · 37

First-principles study of Ag, Au, Cu, and Li defects in MoS 2 and their application to memristors

2025 · Touko Lehenkari, Shuei-De Huang, et al. · Physical Review Materials · 8

Resistive Switching Behaviors in Vertically Aligned MoS 2 Films with Cu, Ag, and Au Electrodes

2026 · Shuei-De Huang, Touko Lehenkari, et al. · ACS Applied Electronic Materials · 5

Exploring ultrathin tungsten disulfide as a diffusion barrier for copper interconnects: advanced packaging reliability and a first-principles study

2025 · Vijay D. Chavan, Touko Lehenkari, et al. · Materials Today Nano · 2

Embrittlement Analysis of $$\sum {{{{5}\left[ {{21}0} \right]} \mathord{\left/ {\vphantom {{{5}\left[ {{21}0} \right]} {\left( {\overline{1}\overline{2}0} \right)}}} \right. \kern-\nulldelimiterspace} {\left( {-{1}-{2}0} \right)}}}$$ FeAl Grain Boundary in Presence of Defects: An Ab Initio Study

2021 · Touko Lehenkari, S. Assa Aravindh, et al. · Metallurgical and Materials Transactions A · 1

Kinetic Monte Carlo scripts for Cu clusters and filaments in va-MoS2 memristors

2026 · Lehenkari, Touko · Zenodo (CERN European Organization for Nuclear Research)

Cu intercalation and field-driven filament formation in vertically aligned MoS$_2$ memristors

2026 · Lehenkari, Touko, Komsa, Hannu-Pekka · arXiv (Cornell University)

Frequency- and Time-Dependent Electrical Response of Cu/VA-MoS2 Memristors

2026 · Shuei-De Huang, Topias Järvinen, et al. · ACS Applied Electronic Materials

Supplementary Material

2026 · Lehenkari, Touko, Komsa, Hannu-Pekka · AIP Publishing

Memristors from vertically-aligned transition metal dichalcogenide films: computational screening study

2026 · Lehenkari, Touko, Komsa, Hannu-Pekka · AIP Publishing

Memristors from vertically aligned transition metal dichalcogenide films: Computational screening study

2026 · Touko Lehenkari, Hannu-Pekka Komsa · Applied Physics Letters

Correction to: Embrittlement Analysis of Σ5[210]/(-1-20) FeAl Grain Boundary in Presence of Defects: An Ab Initio Study

2021 · Touko Lehenkari, S. Assa Aravindh, et al. · Metallurgical and Materials Transactions A

Works count: 12

Citation count: 53

H-index: 3

I10-index: 1