Get started
Author

Peter Hahmann

Observed name: P. Hahmann
OpenAlex ID: A5077317196
High resolution variable-shaped beam direct write
2007 · Peter Hahmann, Lutz Bettin, et al. · Microelectronic Engineering · 18
Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
2008 · Katja Keil, Kang-Hoon Choi, et al. · Microelectronic Engineering · 14
50 years of electron beam lithography: Contributions from Jena (Germany)
2008 · Peter Hahmann, Olaf Fortagne · Microelectronic Engineering · 10
WePrint 200 — The fast e-beam printer with high throughput
1995 · O. Fortagne, P. Hahmann, et al. · Microelectronic Engineering · 6
High resolution patterning – Preparation of VSB systems for 22nm node capability
2009 · Peter Hahmann, Monika Boettcher, et al. · Microelectronic Engineering · 5
Electron beam direct write: shaped beam overcomes resolution concerns
2007 · Ines Stolberg, Laurent Pain, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Multiple beam-shaping diaphragm for efficient exposure of gratings
1993 · H. Elsner, P. Hahmann, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Accuracy requirements for adjusting variable-shaped beam systems for the production of submicron patterns
1979 · H. J. Binder, P. Hahmann · Journal of Vacuum Science and Technology · 4
Optimization of BSE-detector for e-beam direct write lithography
2009 · H. Alves, P. Hahmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Monte Carlo modeling of BSE reflection in e-beam writers
2010 · H. Alves, K.-P. Johnsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Critical dimension adapted alignment for EBDW
2005 · U. Weidenmueller, P. Hahmann, et al. · Microelectronic Engineering · 2
Evaluation of fine pattern definition with electron-beam direct writing lithography
2000 · Tsann-Bim Chiou, Peter Hahmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Calculation of fields of magnetic deflection systems with FEM using a vector potential approach — Part II: time-dependent fields
2008 · T. Elster, D. Stahl, et al. · Physics Procedia · 1
PDF
Calculation of fields of magnetic deflection systems with FEM using a vector potential approach — Part I: stationary fields
2008 · T. Elster, D. Stahl, et al. · Physics Procedia · 1
Mix and match capability of e-beam direct-write for the 65-nm technology
2003 · Yves Laplanche, Murielle Charpin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Cellector: A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask and direct write applications
1999 · H. Hartmann, R. Steinmetz, et al. · Microelectronic Engineering · 1
High resolution cell projection
2009 · U. Weidenmueller, P. Hahmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
E-beam direct write alignment strategies for the next generation node
2008 · H. Alves, P. Hahmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Resist Processes for High Resolution Mask and Direct Write Applications Using the Latest Vistec VSB Electron Column
2007 · H. Sailer, M. Irmscher, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Advantageous Exposure of X Architecture Patterns when Using a Variable-Shaped Beam Tool
2004 · Monika Boettcher, Juergen Gramss, et al. · Japanese Journal of Applied Physics
PDF
Advantageous exposure of X architecture pattern when using a variable shaped beam tool
2004 · W. Dorl, M. Boettcher, et al. · International Microprocesses and Nanotechnology Conference (MNC)
ZBA31: an advanced mask writer meeting the demands of the 1-gigabit DRAM generation
1995 · Christian Ehrlich, Olaf K. Fortagne, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Phase shift mask making by e-beam lithography
1993 · H. Elsner, P. Hahmann · Microelectronic Engineering
Electron beam maskmaking using photoresists
1992 · A. Weidner, P. Hahmann · Microelectronic Engineering
Works count: 24
Citation count: 78
H-index: 5
I10-index: 3
Year
Topic
Type