Author

S. V. Jagadeesh Chandra

Observed names: S V J Chandra, S V Jagadeesh Chandra, S. V. JAGADEESH CHANDRA, S.V. Jagadeesh CHANDRA, S.V. Jagadeesh Chandra, Venkata Jagadeesh Chandra Sangaraju

Institution: GITAM University

Observed institutions: Sri Venkateswara University, Uninova, Instituto de Nanoestruturas Nanomodelação e Nanofabricação, Centro de Investigação em Materiais, Jeonbuk National University, Universidade Nova de Lisboa, GITAM University

ORCID: 0000-0001-6418-9066

Observed ORCID: 0000-0001-6418-9066

OpenAlex ID: A5079402887

Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films

2007 · S.V. Jagadeesh Chandra, S. Uthanna, et al. · Applied Surface Science · 87

Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO2 thin films by DC magnetron sputtering

2011 · M. Chandra Sekhar, P. Kondaiah, et al. · Applied Surface Science · 52

Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

2010 · S.V. Jagadeesh Chandra, Chel-Jong Choi, et al. · Materials Science in Semiconductor Processing · 28

Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors

2013 · M. Chandra Sekhar, P. Kondaiah, et al. · Superlattices and Microstructures · 22

Substrate temperature influenced physical properties of silicon MOS devices with TiO 2 gate dielectric

2012 · M. Chandra Sekhar, P. Kondaiah, et al. · Surface and Interface Analysis · 22

Modulations in effective work function of platinum gate electrode in metal-oxide-semiconductor devices

2011 · S. V. Jagadeesh Chandra, E. Fortunato, et al. · Thin Solid Films · 17

Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films

2008 · S. V. Jagadeesh Chandra, M. Chandrasekhar, et al. · Journal of Materials Science Materials in Electronics · 17

Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films

2007 · S. V. Jagadeesh Chandra, G. Mohan Rao, et al. · Crystal Research and Technology · 16

Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks

2019 · Kumar Mallem, S.V. Jagadeesh Chandra, et al. · Thin Solid Films · 15

Effect of Annealing Ambient on Structural and Electrical Properties of Ge Metal-Oxide-Semiconductor Capacitors with Pt Gate Electrode and HfO2 Gate Dielectric

2010 · S. V. Jagadeesh Chandra, Myung-Il Jeong, et al. · MATERIALS TRANSACTIONS · 15

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Effect of Postdeposition Annealing on the Structural, Electrical, and Optical Properties of DC Magnetron Sputtered Ta2O5 Films

2007 · S. V. Jagadeesh Chandra, P. Sreedhara Reddy, et al. · Research Letters in Materials Science · 14

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Effect of post metallization annealing on structural and electrical properties of Ge metal-oxide-semiconductor (MOS) capacitors with Pt/HfO2 gate stack

2011 · S.V. Jagadeesh Chandra, Jin-Sung Kim, et al. · Microelectronic Engineering · 13

Effective Metal Work Function of Pt Gate Electrode in Ge Metal Oxide Semiconductor Device

2010 · S. V. Jagadeesh Chandra, Mi-Ra Jeong, et al. · Journal of The Electrochemical Society · 13

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Oxygen partial pressure influenced stoichiometry, structural, electrical, and optical properties of DC reactive sputtered hafnium oxide films

2020 · Sunke Venkataiah, S.V. Jagadeesh Chandra, et al. · Surface and Interface Analysis · 12

Influence of substrate temperature on the structural, dielectric and optical properties of RF magnetron sputtered Ta2O5films

2010 · S Uthanna, S V Jagadeesh Chandra, et al. · IOP Conference Series Materials Science and Engineering · 8

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Characterization of bias magnetron sputtered tantalum oxide films for capacitors

2009 · M. Chandrasekhar, S. V. Jagadeesh Chandra, et al. · 8

Influence of substrate bias voltage on the physical, electrical and dielectric properties of RF magnetron sputtered TiO2films

2012 · P Kondaiah, M Chandra Sekhar, et al. · IOP Conference Series Materials Science and Engineering · 6

Investigations on Compositional, Structural and Optical Properties of Thermally Oxidized HfO2 Films

2021 · S. Venkataiah, S. V. Jagadeesh Chandra, et al. · Arabian Journal for Science and Engineering · 5

Influence of Ultra-Thin Ge3N4 Passivation Layer on Structural, Interfacial, and Electrical Properties of HfO2/Ge Metal-Oxide–Semiconductor Devices

2019 · Kumar Mallem, S. V. Jagadeesh Chandra, et al. · Journal of Nanoscience and Nanotechnology · 4

An Efficient Online Mileage Indicator by Using Sensors for New Generation Automobiles

2013 · B. Naresh Kumar Reddy, M. Naraimhulu, et al. · Advanced Computing, Networking and Security · 4

Thermal stability of high-k Er-silicate gate dielectric formed by interfacial reaction between Er and SiO2 films

2008 · Sung-Yong Chang, Myeong-Il Jeong, et al. · Materials Science in Semiconductor Processing · 4

Effect of post-deposition annealing on the structural and electrical properties of dc magnetron sputtered Ta2O5 films

2008 · S Uthanna, S V J Chandra, et al. · Journal of Physics Conference Series · 4

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Investigations on the Nitride Interface Engineering at HfO2/Ge stacks for MOS devices

2018 · G. Venkata Rao, M. Kumar, et al. · Materials Today Proceedings · 3

The effect of Substrate temperature on physical and electrical properties of DC magnetron sputtered (Ta2O5)0.85(TiO2)0.15films

2012 · M Chandra Sekhar, S Uthanna, et al. · IOP Conference Series Materials Science and Engineering · 3

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Effects of post metallization annealing on modulation in effective work function of platinum gate electrode in germanium metal‐oxide‐semiconductor devices

2012 · S. V. Jagadeesh Chandra, Woong‐Ki Hong, et al. · Surface and Interface Analysis · 2

Works count: 41

Citation count: 401

H-index: 13

I10-index: 14