Author

Roger F. Caldwell

Observed name: Roger Caldwell

Observed institution: ASML (United States)

OpenAlex ID: A5080805137

Practical method for full-chip optical proximity correction

1997 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 43

Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars

1997 · J. Fung Chen, Tom Laidig, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 24

Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

1999 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I

1998 · Robert J. Socha, John S. Petersen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Resolution enhancement with high-transmission attenuating phase-shift masks

1999 · Robert J. Socha, Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

1998 · John S. Petersen, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

OPC technology road map to 0.14-μm design rules

1997 · J. Fung Chen, Thomas L. Laidig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

1999 · Robert J. Socha, Xuelong Shi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

1999 · Kent H. Nakagawa, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

2000 · J. Fung Chen, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

CD error sensitivity to "sub-killer" defects at k 1 near 0.4: II

1999 · Kent H. Nakagawa, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Pattern measurements of reticles with optical proximity correction assist features using the atomic force microscope

1999 · Kuo-Jen Chao, Robert J. Plano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

CD error sensitivity to "sub-killer" defects at k1 near 0.4

1999 · J. Fung Chen, Nathan A. Diachun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Manufacturing an advanced process characterization reticle incorporating halftone biasing

1999 · Kent H. Nakagawa, Douglas J. Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

1998 · Eli Almog, Roger F. Caldwell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

1998 · Hao H. Lu, Raymond Hwang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 16

Citation count: 119

H-index: 6

I10-index: 5