Author

Yair Eran

Observed institution: Applied Materials (Israel)

OpenAlex ID: A5080973266

Quality assessment of advanced photomasks using the Q-CAP cluster tool

2001 · Kai Peter, Thomas Schaetz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Study of high sensitivity DUV inspection for sub-20nm devices with complex OPCs

2014 · Sang Hoon Han, Hong Yul Jung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Real-time line-width measurements: a new feature for reticle inspection systems

1997 · Yair Eran, Gad Greenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Cluster tool solution for fabrication and qualification of advanced photomasks

2000 · Thomas Schaetz, Hans Hartmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

New approach to mask and wafer performance optimization for system-on-a-chip (SOC) devices

2000 · Gidon Gottlib, Yair Eran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Halftone PSM inspection sensitivity of OPC line/space pattern for 150-nm generation

2000 · Chun-Hung Wu, Jackie Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Development of a new defect sensitivity monitor for advanced OPC reticle technology

1999 · Wolfgang Staud, Yair Eran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Improved image acquistion for advanced reticle inspection

1997 · Yair Eran, Gad Greenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Mask inspection and real-time linewidth measurements

1996 · Yair Eran, Gad Greenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Die-to-database defect detection for reticles of 64- and 256-Mbit DRAMs

1995 · Yair Eran, Gad Greenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Mask process design optimization based on quality mapping using standard mask inspection equipment

2001 · Shen C. Kuo, TaiSheng Tan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

New approach to improve CD uniformity based on mask quality

2001 · Roman Liebe, Carmen Jaehnert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Defect dispositioning using mask printability on attenuated phase-shift production photomasks

2001 · Justin W. Novak, Benjamin G. Eynon, Jr., et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Impact of pattern proximity correction on die-to-database mask inspection

2000 · Anja Rosenbusch, Vicky Bailey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

150-nm DR contact holes die-to-database inspection

2000 · Shen C. Kuo, Clare Wu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

2000 · Amikam Sade, Juergen Fandrich, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Improvements to mask inspectability by use of pattern proximity correction

2000 · Anja Rosenbusch, Vicky Bailey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond

1999 · Emanuele Baracchi, Hans-Juergen Brueck, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Aerial image analysis based on UV reticle inspection

1999 · Wolfgang Staud, Yair Eran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Toward 150-nm defect detection capability

1998 · Yair Eran, Gad Greenberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Use of line-width error detection for quality control in reticle fabrication

1998 · Yair Eran, Gidon Gottlib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Die-to-database inspection of 256-Mb DRAM reticles

1996 · Yair Eran, Nissim Elmaliach, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Manufacturing and inspection of OPC and PSM masks

1995 · Wolfgang Staud, Karen Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Advanced die-to-database reticle machine for 64-Mbit DRAMs

1994 · Yair Eran, Gideon Rossman · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Die-to-database inspection and defect specification

1994 · Yair Eran, Ido Weinberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 27

Citation count: 14

H-index: 2

I10-index: