Get started
Author

Alexandra Krawicz

Photofunctional Construct That Interfaces Molecular Cobalt-Based Catalysts for H2 Production to a Visible-Light-Absorbing Semiconductor
2013 · Alexandra Krawicz, Jinhui Yang, et al. · Journal of the American Chemical Society · 150
Synthesis of Polysiloxane Stabilized Palladium Colloids and Evidence of Their Participation in Silaesterification Reactions
2003 · Bhanu P. S. Chauhan, Jitendra S. Rathore, et al. · Journal of the American Chemical Society · 73
Using Molecular Design to Control the Performance of Hydrogen-Producing Polymer-Brush-Modified Photocathodes
2014 · Diana Cedeno, Alexandra Krawicz, et al. · The Journal of Physical Chemistry Letters · 64
Energetics and efficiency analysis of a cobaloxime-modified semiconductor under simulated air mass 1.5 illumination
2014 · Alexandra Krawicz, Diana Cedeno, et al. · Physical Chemistry Chemical Physics · 55
Thickness, Surface Morphology, and Optical Properties of Porphyrin Multilayer Thin Films Assembled on Si(100) Using Copper(I)-Catalyzed Azide−Alkyne Cycloaddition
2011 · Peter K. B. Palomaki, Alexandra Krawicz, et al. · Langmuir · 45
Layer-by-layer assembly of Zn(ii) and Ni(ii) 5,10,15,20-tetra(4-ethynylphenyl)porphyrin multilayers on Au using copper catalyzed azide-alkyne cycloaddition
2012 · Alexandra Krawicz, Joseph Palazzo, et al. · RSC Advances · 23
Hybrid photocathodes for solar fuel production: coupling molecular fuel-production catalysts with solid-state light harvesting and conversion technologies
2015 · Diana Cedeno, Alexandra Krawicz, et al. · Interface Focus · 19
Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges
2022 · Angélique Raley, Lior Huli, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 18
Temperature-Dependent and Bistable Current–Voltage Measurements in Zinc Porphyrin Molecular Junctions
2015 · Swatilekha Saha, Adrien Nicolaı̈, et al. · ACS Applied Materials & Interfaces · 6
Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography
2007 · Francis Houlihan, Alberto Dioses, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Effect of resist surface characteristics on film-pulling velocity in immersion lithography
2006 · S. Schuetter, T. Shedd, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results
2008 · Francis Houlihan, Alberto Dioses, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
High volume manufacturing innovations for metal-oxide resist patterning
2025 · Nicholas Latham, Belle Antonovich, et al. · Advances in Patterning Materials and Processes · 1
Tight-pitch contact-hole patterns in EUV lithography
2025 · Cong Que Dinh, Nathan Antonovich, et al. · Advances in Patterning Materials and Processes · 1
Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)
2008 · Francis Houlihan, Shinji Miyazaki, et al. · Journal of Photopolymer Science and Technology · 1
PDF
Optimization of resist underlayer and novel development method for extreme ultraviolet
2026 · Yuya Okumura, Kanzo Kato, et al. · Advances in Patterning Materials and Processes
Coater/developer-based patterning process techniques to achieve tight pitches towards high numerical aperture extreme ultraviolet lithography
2025 · Shu Kitamura, Lior Huli, et al. · International Conference on Extreme Ultraviolet Lithography
Coater/developer-based techniques to improve high-resolution EUV patterning
2022 · Kanzo Kato, Lior Huli, et al. · International Conference on Extreme Ultraviolet Lithography
Coater/developer and new underlayer application to sub-30nm process
2021 · Kanzo Kato, Naoki Shibata, et al. · International Conference on Extreme Ultraviolet Lithography
Porphyrin Molecular Multilayer Thin-Films on Gold (111) Electrodes for Electro-optical Applications
2012 · Alexandra Krawicz, Guoguang Qian, et al. · Bulletin of the American Physical Society
Porphyrin-based CuAAC Coupled Layer-by-Layer Molecular Multilayers on Gold (111) Electrodes for Electro-optical Applications
2012 · Alexandra Krawicz, Peter Dinolfo · ECS Meeting Abstracts
PDF
Porphyrin-Based Molecular Multilayer Films Assembled via Copper(I)-Azide-Alkyne Cycloaddition Coupled Layer-by-Layer Method for Light Harvesting Applications
2012 · Alexandra Krawicz
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
2007 · Francis Houlihan, Alberto Dioses, et al. · Journal of Photopolymer Science and Technology
PDF
Works count: 23
Citation count: 464
H-index: 8
I10-index: 8
Year
Topic
Type