Work

Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

Year: 2008

Type: article

Abstract: We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.21.383

Authors: Francis Houlihan, Shinji Miyazaki, Alberto Dioses, Lin Zhang, Yuki Ubayashi, Kazuyoshi Ohta, Joseph Oberlander, Alexandra Krawicz, Sumathy Vasanthan, Meng Li, Yayi Wei, PingHung Lu, Mark Neisser

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W1980243644

FWCI: 0.292

Cites: 6

Cited by: 1

Related to: 10