Author

Ping-Hung Lu

Observed names: LU Ping‐Hung, PingHung Lu

Observed institutions: Celanese (United States), Clariant (United States)

OpenAlex ID: A5110075799

2014 · Warren Flack, Robert Hsieh, et al. · IEEE Electronic Components and Technology Conference (ECTC) · 13

TMAH soak process optimization with DNQ positive resist for lift-off applications

2003 · Salem K. Mullen, Medhat A. Toukhy, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Lithographic performance of isomeric hydroxystyrene polymers

1994 · Ralph R. Dammel, M. D. Rahman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability

2009 · Ruzhi Zhang, Allen G. Timko, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Radiation sensitive developable bottom anti-reflective coatings (DBARC) for 193nm lithography: first generation

2007 · Medhat Toukhy, Joseph Oberlander, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Etching spin-on trilayer masks

2008 · David J. Abdallah, Shinji Miyazaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

The effects of etch chemistry on the etch rates of ArF BARC products

2006 · Hong Zhuang, Dave Abdallah, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

2009 · Francis M. Houlihan, Alberto Dioses, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Development of two new thick-film photoresists

1996 · Stanley A. Ficner, James Hermanowski, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Novel DNQ PACs for high-resolution i-line lithography

1992 · William R. Brunsvold, Nicholas K. Eib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography

2007 · Francis Houlihan, Alberto Dioses, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

High resolution negative i-line resist and process for metal lift-off applications

2002 · Medhat A. Toukhy, Salem K. Mullen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Novel polymeric dyes for bottom antireflective coatings

1997 · Shuji Ding, Ping-Hung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Synthesis and lithographic performance of highly branched polymers from hydroxyphenylmethylcarbinols

1996 · James R. Sounik, Richard Vicari, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Novolak-polyhydroxystyrene copolymer and photoresist compositions

1994 · M. D. Rahman, Ping-Hung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

2008 · Francis Houlihan, Alberto Dioses, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Effects of structural differences in speed enhancers (dissolution promoters) on positive photoresist composition

1998 · Michelle M. Cook, M. D. Rahman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Novel process of isolating novolac resin fractions

1997 · M. D. Rahman, Ping-Hung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

2008 · Francis Houlihan, Shinji Miyazaki, et al. · Journal of Photopolymer Science and Technology · 1

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High-temperature negative resist tunable for new lift-off applications

2004 · Medhat A. Toukhy, PingHung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Performance impact of novel polymeric dyes in photoresist applications

1999 · Ping-Hung Lu, Salem Mehtsun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Novolak resin for ultrafast high-resolution positive i-line photoresist compositions

1998 · M. D. Rahman, Ping-Hung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Novel novolak block copolymers for advanced i-line resists

1998 · Stan F. Wanat, M. D. Rahman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Statistical experimental design on the optimization of high-performance photoresist

1993 · Stanley A. Ficner, Ping-Hung Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Negative tone i-line photoresist with controlled undercut profile designed for metal deposition to form metal interconnects

2024 · Anupama Mukherjee, Medhat Toukhy, et al. · Advances in Patterning Materials and Processes

Works count: 40

Citation count: 90

H-index: 5

I10-index: 1