Work

TMAH soak process optimization with DNQ positive resist for lift-off applications

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.485198

Authors: Salem K. Mullen, Medhat A. Toukhy, Ping-Hung Lu, Sunit S. Dixit, Paul Sellers

Institution: Clariant (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2088973124

FWCI: 1.345

Cites:

Cited by: 8

Related to: 10