Work

Novolak-polyhydroxystyrene copolymer and photoresist compositions

Year: 1994

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.175378

Authors: M. D. Rahman, Ping-Hung Lu, Mohammad A. Khadim, Elaine Kokinda, Daniel P. Aubin

Institution: Celanese (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4249690482

FWCI:

Cites:

Cited by: 3

Related to: 10