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O. Mourey

Dynamic fuel retention in tokamak wall materials: An in situ laboratory study of deuterium release from polycrystalline tungsten at room temperature
2015 · R. Bisson, S. Markelj, et al. · Journal of Nuclear Materials · 61
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Key plasma parameters for nanometric precision etching of Si films in chlorine discharges
2015 · P. Brichon, E. Despiau-Pujo, et al. · Journal of Applied Physics · 28
Demonstration of 3D sequential FD-SOI on CMOS FinFET stacking featuring low temperature Si layer transfer and top tier device fabrication with tier interconnections
2022 · A. Vandooren, N. Parihar, et al. · IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) · 23
Roughness generation during Si etching in Cl2 pulsed plasma
2016 · Odile Mourey, Camille Petit-Etienne, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 11
Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas
2016 · G. Cunge, M. Darnon, et al. · Applied Physics Letters · 5
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Thermal strain management of III–V heterostructures grown on InP-on-silicon (InPoSi) substrates
2025 · C. Besancon, F. Martin, et al. · Journal of Applied Physics · 4
Large Diameter Epi-Ready InP on Si (InPOSi) Substrates
2023 · Ghyselen, B., Darras, Fx, et al. · HAL · 3
Développement de nouvelles technologies de gravure : mise en évidence de la stochasticité du bombardement ionique lors de procédés plasma industriels
2017 · Odile Mourey · theses.fr (ABES)
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Roughness generation during Si etching in Cl2 pulsed plasmas
2016 · Mourey, Odile, Petit-Etienne, Camille, et al. · HAL
Measuring IVDF through high-aspect holes in pulsed ICP plasma
2015 · Cunge, G., Darnon, M, et al. · HAL
Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions
2015 · Brichon, P., Despiau-Pujo, E., et al. · HAL
Measuring IVDF through high−aspect holes in pulsed ICP plasmas
2015 · Cunge., G., Darnon., M., et al. · HAL
RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas
2015 · Cunge., G., Darnon., M., et al. · HAL
Measuring IVDF through high−aspect holes in ICP plasmas
2015 · Cunge., G., Darnon., M., et al. · HAL
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes
2014 · P. Brichon, E. Despiau-Pujo, et al. · Silicon Nanoelectronics Workshop (SNW)
MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”
2014 · Brichon, P., Despiau-Pujo, E., et al. · HAL
Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma
2014 · Mourey, Odile, Petit-Etienne, C., et al. · HAL
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes
2013 · Brichon, P., Despiau-Pujo, E., et al. · HAL
Works count: 18
Citation count: 135
H-index: 5
I10-index: 4
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