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Alex I. Ershov

Observed names: A I Ershov, A. I. Ershov, Alex Ershov, Alexander I. Ershov, ERSHOV, ALEXANDER, I.
OpenAlex ID: A5087746675
Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
2017 · Igor Fomenkov, David Brandt, et al. · Advanced Optical Technologies · 183
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Performance optimization of MOPA pre-pulse LPP light source
2015 · Alexander A. Schafgans, Daniel J. Brown, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 48
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
2018 · Igor V. Fomenkov, Alexander A. Schafgans, et al. · Extreme Ultraviolet (EUV) Lithography · 44
LPP EUV source development for HVM
2007 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 42
LPP source system development for HVM
2009 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37
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Laser-produced plasma light source for EUVL
2010 · Igor V. Fomenkov, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
LPP EUV source readiness for NXE 3300B
2014 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25
Development of stable extreme-ultraviolet sources for use in lithography exposure systems
2012 · Igor V. Fomenkov, Bruno La Fontaine, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23
LPP EUV source development for HVM
2006 · Björn A. M. Hansson, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23
Laser-produced plasma source system development
2007 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Laser produced plasma EUV sources for device development and HVM
2012 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Laser-produced plasma source system development
2008 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
EUV source collector
2006 · Norbert R. Böwering, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond
2013 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Laser-produced plasma light source for EUVL
2009 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
LPP source system development for HVM
2011 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Lifetime and refurbishment of multilayer LPP collector mirrors
2013 · Torsten Feigl, Marco Perske, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
LPP EUV conversion efficiency optimization
2005 · J. R. Hoffman, A. N. Bykanov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Laser produced plasma light source development for HVM
2014 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography
2003 · Vladimir B. Fleurov, Daniel J. Colon III, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Laser produced plasma light source for EUVL
2011 · Igor V. Fomenkov, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
LPP source system development for HVM
2010 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
CO2/Sn LPP EUV sources for device development and HVM
2013 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Light sources for EUV lithography at the 22-nm node and beyond
2012 · Igor V. Fomenkov, Norbert R. Böwering, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
High power low cost drive laser for LPP source
2006 · Igor V. Fomenkov, Björn A. M. Hansson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Works count: 53
Citation count: 732
H-index: 15
I10-index: 22
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