Author

Akihisa Nagano

Observed names: A. Nagano, Akihisa NAGANO, Nagano, Akihisa

Institution: Ushio (Japan)

Observed institutions: University of Hyogo, Ushio (Japan)

ORCID: 0009-0002-8711-4336

Observed ORCID: 0009-0002-8711-4336

OpenAlex ID: A5088737014

Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser

2007 · Akihisa Nagano, Takahiro Inoue, et al. · Applied Physics Letters · 20

Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

2008 · Akihisa Nagano, Takayasu Mochizuki, et al. · Applied Physics Letters · 15

High-radiance LDP source for mask inspection application

2014 · Yusuke Teramoto, Bárbara Santos, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

High-radiance LDP source: clean, reliable, and stable EUV source for mask inspection

2016 · Yusuke Teramoto, Bárbara Santos, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Influence of a laser intensity on EUV brightness and ion speed from a laser-assisted discharge-produced plasma

2024 · F. Sato, A. Nagano, et al. · Applied Physics Letters · 6

High-radiance LDP source for mask-inspection application

2015 · Yusuke Teramoto, Bárbara Santos, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

IRIS: an Integrated International Approach to Design and Deploy a New Generation Reactor

2001 · Mario D. Carelli, Bojan Petrović, et al. · Virtual Community of Pathological Anatomy (University of Castilla La Mancha) · 6

IRIS: International New Generation Reactor

2000 · Mario D. Carelli, Dmitry Paramonov, et al. · Virtual Community of Pathological Anatomy (University of Castilla La Mancha) · 6

High-brightness LDP EUV source for EUV mask inspection

2021 · Noritaka Ashizawa, Yoshihiko Sato, et al. · International Conference on Extreme Ultraviolet Lithography · 5

EUV Light Sources by Laser-Produced Plasmas Using Cryogenic Xe and Li Targets

2008 · Sho AMANO, Akihisa NAGANO, et al. · The Review of Laser Engineering · 5

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Characterization of Fast Ion and Neutral Debris from Laser-Produced Lithium Plasmas

2007 · Tsuguhisa Sekioka, Akihisa Nagano, et al. · Japanese Journal of Applied Physics · 5

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Multi-peak structure of the ion current in laser produced plasma

2010 · P. Nica, M. Agop, et al. · The European Physical Journal D · 4

Improvement of LDP EUV source performance for actinic patterned mask inspection

2023 · Safak Sayan, Kishore K. Chakravorty, et al. · SPIE Optical and EUV Nanolithography · 1

High-radiance LDP source for mask inspection and beam line applications (Conference Presentation)

2017 · Yusuke Teramoto, Bárbara Santos, et al. · 1

EUV source improvements for brightness and debris mitigation

2025 · Shunichi Morimoto, Yoshihiro Takahata, et al. · SPIE Photomask Technology Conference

High-brightness LDP source

2025 · Shunichi Morimoto, Masakata Mamizuka, et al. · SPIE Optical and EUV Nanolithography

LDP EUV source performance and cost-of-ownership improvement

2024 · Yusuke Teramoto, Shunichi Morimoto, et al. · International Conference on Extreme Ultraviolet Lithography

High-brightness LDP source

2023 · Masataka Mamizuka, Teruaki Kawajiri, et al. · International Conference on Extreme Ultraviolet Lithography

High-brightness LDP source

2023 · Kazuya Aoki, Yoshihiko Sato, et al. · Photomask and next-generation lithography mask technology. Conference

High-brightness LDP source for EUVL mask inspection

2022 · Ryuta Furuya, Kazuya Aoki, et al. · International Conference on Extreme Ultraviolet Lithography

High-brightness LDP source for EUVL mask inspection

2022 · Kazuya Aoki, Yoshihiko Sato, et al. · Photomask and next-generation lithography mask technology. Conference

Sn-fueled high-brightness compact EUV light source

2016 · Yusuke Teramoto, Bárbara Santos, et al. · High-Brightness Sources and Light-Driven Interactions

Extreme Ultraviolet Source Using Laser-Produced Li Plasma

2009 · Akihisa Nagano, Sho Amano, et al. · IEEJ Transactions on Electronics Information and Systems

Works count: 24

Citation count: 104

H-index: 6

I10-index: 4