Author

Se Yun Jo

Institution: Myongji University

Observed institution: Myongji University

ORCID: 0009-0000-7200-974X

Observed ORCID: 0009-0000-7200-974X

OpenAlex ID: A5101363016

Effects of the Applied Power of Remote Plasma System With Green Alternative Chamber Cleaning Gas of Carbonyl Fluoride

2025 · Se Yun Jo, Ah Hyun Park, et al. · IEEE Transactions on Semiconductor Manufacturing · 7

Enhancement of chamber dry-cleaning performance with nitrous oxide additive to carbonyl fluoride

2025 · Hyuck Byun, Chae Woon Kim, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2

Efficiency enhancement of chamber dry-cleaning with carbonyl fluoride by additive gas

2025 · Se Yun Jo, Sang Jeen Hong · Japanese Journal of Applied Physics · 1

Enhancement of PECVD Chamber Dry-Cleaning With Carbonyl Fluoride by Additive Gases

2026 · Se Yun Jo, Sang Jeen Hong · IEEE Transactions on Semiconductor Manufacturing

Design of plasma strip chamber for uniform gas supply with fluid flow simulation

2024 · Ji Won Jang, Se Yun Jo, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Plasma Pretreatment System for the Reduction of By-Product Particles in Semiconductor Manufacturing

2024 · Se Yun Jo, Minsuk Choi, et al. · IEEE Transactions on Semiconductor Manufacturing

Works count: 6

Citation count: 10

H-index: 2

I10-index: