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Noboru Yamaguchi

Observed names: N. Yamaguchi, Yamaguchi, Noboru
Institution: Ulvac (Japan)
ORCID: 0009-0006-0053-5226
Observed ORCID: 0009-0006-0053-5226
OpenAlex ID: A5101901192
Control of magnetization in spinel-type Fe3O4 thin films by N2 ion implantation
2014 · Eiji Kita, Kazunaga Ono, et al. · Japanese Journal of Applied Physics · 12
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Plasma immersion ion implantation for tunnel oxide passivated contact in silicon solar cell
2024 · Noboru Yamaguchi, Ralph Müller, et al. · Solar Energy Materials and Solar Cells · 6
Development of ion source with a washer gun for pulsed neutral beam injection
2008 · T. Asai, N. Yamaguchi, et al. · Review of Scientific Instruments · 5
Simple fabrication of back contact heterojunction solar cells by plasma ion implantation
2017 · Koichi Koyama, Noboru Yamaguchi, et al. · Japanese Journal of Applied Physics · 4
Characterization of tunnel oxide passivated contact fabricated by sputtering and ion implantation technique
2023 · Noboru Yamaguchi, Shasha Li, et al. · Japanese Journal of Applied Physics · 3
Hydrogen production from solar light energy by photovoltaic water electrolysis
2001 · Takashi Ohmori, Hang-Ju Go, et al. · Hemijska industrija · 3
Development of n-PERT solar cell using non mass separation type ion implantation
2017 · Noboru Yamaguchi, Daisuke Hironiwa, et al. · The Japan Society of Applied Physics · 1
Polymer Nanotechnology
2006 · Noboru Yamaguchi · Seikei-Kakou · 1
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Optimizing Uniformity of Fluxes to Wafers in SF 6 / O 2 /SiF 4 Inductively Coupled Plasmas Using Multiple Antennas
2026 · Maryam Khaji, Fatima Arellano, et al. · IEEE International Conference on Plasma Science (ICOPS)
(Area5 5TuO7-5) Application of plasma immersion ion implantation technics to TOPCon solar cells
2023 · 山口 昇, Noboru Yamaguchi, et al. · Institutional Repositories DataBase (IRDB)
Evaluation of passivation layer for TOPCon formed by sputtering and ion implantation (WeO-31g-07])
2022 · 山口, 昇, Yamaguchi, Noboru, et al. · Institutional Repositories DataBase (IRDB)
Passivation Quality and Conductivity Improvements of Counter-doped Amorphous Silicon Films by Flash Lamp Annealing
2021 · Yujia LIU, Huynh Thi Cam Tu, et al. · International Conference on Solid State Devices and Materials (SSDM)
Silicon Heterojunction Solar Cells with Flash Lamp Annealing on a Counter-Doped n-a-Si Film
2021 · Ukei Riyuu, Huynh Thi Cam Tu, et al. · The Japan Society of Applied Physics
Recovery of PH 3 plasma-ion-implantation-induced damages in p-type amorphous silicon by flash lamp annealing
2021 · Ukei Riyuu, Huynh Thi Cam Tu, et al. · The Japan Society of Applied Physics
Performance of Silicon Heterojunction Solar Cells with Counter-doped n-a-Si
2020 · Tu ThiCam Huynh, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH3 plasma ion implantation
2019 · Huynh-Thi-Cam Tu, Koichi Koyama, et al. · Thin Solid Films
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Formation of counter-doped n-a-Si films with good passivation quality by plasma ion implantation
2018 · Tu ThiCam Huynh, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
Low Cost Fabrication of Back Contact Crystalline-Silicon Heterojunction Solar Cells with n-a-Si Layers Partially Converted from p-a-Si by Phosphine (PH3) Plasma Ion-Implantation
2018 · Huynh Thi Cam Tu, Koichi Koyama, et al. · World Conference on Photovoltaic Energy Conversion
Plasma Ion Implantation: a Promising Method for Fabricating the Low Cost Interdigitated Back Contact Silicon Heterojunction Solar Cell
2018 · Tu ThiCam Huynh, Koichi Koyama, et al. · The Japan Society of Applied Physics
Progress in ion implantation technology for solar cells
2018 · Noboru Yamaguchi, Daisuke Hironiwa, et al. · The Japan Society of Applied Physics
a-Si/c-Si heterojunction solar cells using counter doping by plasma ion implantation
2017 · Koichi Koyama, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
Depth Profiles of P and H atom at a-Si/c-Si Interface by Plasma Ion Implantation
2017 · Koichi Koyama, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
Development of Simple Fabrication Process of Back Contact Hetero-Junction Solar cells by Plasma Ion Implantation -- Control of Conduction Type of a-Si/c-Si Electrodes
2016 · Koichi Koyama, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
a-Si/c-Si heterojunction solar cells with plasma doping
2016 · Koichi Koyama, Noboru Yamaguchi, et al. · The Japan Society of Applied Physics
Development of Pulsed Ion Beam Source by Washer Gun
2008 · Yashushi Ono, Heizo Imanaka, et al. · IEEJ Transactions on Fundamentals and Materials
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Works count: 26
Citation count: 35
H-index: 4
I10-index: 1
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