Author

Yuansheng Ma

Observed name: Yuan-sheng Ma

Institutions: Siemens (Germany), Nankai University, Siemens (United States)

Observed institutions: University of Central Florida, Central South University of Forestry and Technology, University of Wisconsin System, Siemens (Germany), University of Wisconsin–Madison, Northwestern Polytechnical University, Nankai University, GlobalFoundries (United States), Siemens (United States), Advanced Micro Devices (United States), Mentor Graphics (United States), State Key Laboratory of Modern Optical Instruments, Siemens (China), Zhejiang University

ORCID: 0009-0008-3241-1599

Observed ORCID: 0009-0008-3241-1599

OpenAlex ID: A5102166243

Direct extraction of semiconductor device parameters using lateral optimization method

1999 · A Ortiz-Conde, Yuansheng Ma, et al. · Solid-State Electronics · 65

Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications

2014 · Yuansheng Ma, J. Andres Torres, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 50

Line edge roughness impact on critical dimension variation

2007 · Yuansheng Ma, Harry J. Levinson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 45

Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography

2005 · Ivan Junarsa, Mark P. Stoykovich, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 44

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Decomposition strategies for self-aligned double patterning

2010 · Yuansheng Ma, Jason Sweis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 40

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

2007 · Thomas Wallow, Alden Acheta, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30

Incorporating DSA in multipatterning semiconductor manufacturing technologies

2015 · Yasmine Badr, J. A. Torres, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29

Line edge roughness of sub-100 nm dense and isolated features: Experimental study

2003 · Yuansheng Ma, G. Tsvid, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 25

Recent Progress in Flexible Fibrous Batteries

2018 · Zhaowei Xi, Xiang Zhang, et al. · ChemElectroChem · 22

Line edge roughness and photoresist percolation development model

2002 · Yuansheng Ma, J. Shin, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20

Considerations in source-mask optimization for logic applications

2010 · Yunfei Deng, Yi Zou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

Calibration and application of a DSA Compact model for graphoepitaxy hole processes using contour-based metrology

2014 · Germain Fenger, Andrew Burbine, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

2014 · J. Andres Torres, Kyohei Sakajiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Machine learning based wafer defect detection

2019 · Yuansheng Ma, Feng Wang, et al. · Design-Process-Technology Co-optimization for Manufacturability · 14

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

2015 · Yuansheng Ma, Junjiang Lei, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

On Klein tunneling of low-frequency elastic waves in hexagonal topological plates

2024 · Yuxin Yao, Yuansheng Ma, et al. · Applied Mathematics and Mechanics · 10

Higher-order topological edge and corner states in C3-symmetric phononic crystal plates

2024 · Kai Zhang, Yuansheng Ma, et al. · Applied Acoustics · 10

The soft actor–critic algorithm for automatic mode-locked fiber lasers

2023 · Jin Li, Kun Chang, et al. · Optical Fiber Technology · 9

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

2010 · Yongchan Ban, Yuansheng Ma, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Estimation of optical constants of thin film by the use of artificial neural networks

1996 · Yuan-sheng Ma, Xu Liu, et al. · Applied Optics · 9

EUV full-chip curvilinear mask options for logic via and metal patterning

2023 · Neal Lafferty, Sagar Saxena, et al. · DTCO and Computational Patterning · 8

Directed self-assembly graphoepitaxy template generation with immersion lithography

2015 · Yuansheng Ma, Junjiang Lei, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 8

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

2014 · Germain Fenger, J. Andres Torres, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Reduction of systematic defects through machine learning from design to fab

2020 · Yuansheng Ma, Le Hong, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 7

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

2016 · Yuansheng Ma, Yan Wang, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 7

Works count: 53

Citation count: 605

H-index: 14

I10-index: 17