Author

Kenji Terao

Observed institution: Ebara (Japan)

OpenAlex ID: A5103557021

Performance of EBeyeM for EUV mask inspection

2011 · Shinji Yamaguchi, Masato Naka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

2014 · Ryoichi Hirano, Susumu Lida, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23

EUV patterned mask inspection system using a projection electron microscope technique

2013 · Hidehiro Watanabe, Ryoichi Hirano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21

Development of EB inspection system EBeyeM for EUV mask

2010 · Takashi Hirano, Shinji Yamaguchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

2013 · Masahiro Hatakeyama, Takeshi Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

2014 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

2014 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection

2013 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

2015 · Ryoichi Hirano, Susumu Iida, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 6

Recent results from EUVL patterned mask inspection using projection electron microscope system

2014 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Capability of model EBEYE M for EUV mask production

2012 · Masato Naka, Shinji Yamaguchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Study of extreme ultraviolet lithography patterned mask inspection tool for half-pitch 11-nm node defect detection performance

2016 · Ryoichi Hirano, Susumu Iida, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5

Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics

2016 · Ryoichi Hirano, Masahiro Hatakeyama, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 4

Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks

2015 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Study of EUVL patterned mask inspection tool for half-pitch (hp) 16nm-11nm node

2015 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system

2016 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Detection capability enhancement with a learning system for PEM mask inspection tool

2015 · Ryoichi Hirano, Masahiro Hatakeyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Mask inspection method using the electron-beam inspection system based on projection electron microscopy

2006 · Atsushi Onishi, Ichirota Nagahama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Capability of particle inspection on patterned EUV mask using model EBEYE M

2014 · Masato Naka, Ryoji Yoshikawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

2013 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

2016 · Ryoichi Hirano, Susumu Iida, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

2014 · Masahiro Hatakeyama, Takeshi Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

2013 · Masahiro Hatakeyama, Takeshi Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Development of Inspection System for EUV Mark with Novel Projection Electron Microscopy (PEM)

2013 · Masahiro Hatakeyama, Takeshi Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 24

Citation count: 177

H-index: 8

I10-index: 7