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Paul C. Hinnen

Rydberg-valence interactions of CO, and spectroscopic evidence characterizing the C′ 1Σ+ valence state
2004 · Michèle Eidelsberg, Françoise Launay, et al. · The Journal of Chemical Physics · 44
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Sub-Doppler laser spectroscopy of H2 and D2 in the range 91–98 nm
1994 · P. C. Hinnen, W. Hogervorst, et al. · Canadian Journal of Physics · 41
Holistic optimization architecture enabling sub-14-nm projection lithography
2014 · Jan Mulkens, Paul C. Hinnen, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 37
Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements
2018 · Jan Mulkens, Michael Kubis, et al. · Metrology, Inspection, and Process Control XXXVI · 35
Lifetime Measurements of the [ITAL]E[/ITAL] [TSUP]1[/TSUP]Π, [FORMULA][F]v=0[/F][/FORMULA] and [FORMULA][F]v=1[/F][/FORMULA] States of [TSUP]12[/TSUP]C[TSUP]16[/TSUP]O, [TSUP]13[/TSUP]C[TSUP]16[/TSUP]O, and [TSUP]13[/TSUP]C[TSUP]18[/TSUP]O
1998 · P. Cacciani, W. Ubachs, et al. · The Astrophysical Journal · 33
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xuv-laser spectroscopy of HD at 92–98 nm
1995 · P. C. Hinnen, S. E. Werners, et al. · Physical Review A · 31
High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements
2013 · Jan Mulkens, Michael Kubis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control
2011 · Kaustuve Bhattacharyya, Noelle Wright, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23
Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)
2014 · Kai-Hsiung Chen, GT Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.
2013 · Jos Benschop, Andre Engelen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20
The application of SMASH alignment system for 65-55-nm logic devices
2007 · M. Miyasaka, H. Saito, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Laser Spectroscopic Studies of theC1Σ+,v= 0 andv= 1 States of CO
1995 · W. Ubachs, P.C. Hinnen, et al. · Journal of Molecular Spectroscopy · 18
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High-resolution laser spectroscopy on H2 at 97?98 nm
1994 · P. C. Hinnen, W. Hogervorst, et al. · Applied Physics B · 13
A demonstration of the Franck—Condon principle upon ionization
1994 · Maarten G.H. Boogaarts, Paul C. Hinnen, et al. · Chemical Physics Letters · 12
On-product overlay solutions for DUV and EUV mix-scanner usage in an EPE-driven patterning world
2022 · Daan Slotboom, Paul Hinnen, et al. · SPIE Optical and EUV Nanolithography · 10
Advances in process overlay: alignment solutions for future technology nodes
2007 · Henry Megens, Richard van Haren, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Observation of Inter-Rydberg Transitions in H[TINF]2[/TINF] Coinciding with Diffuse Interstellar Bands
1997 · W. Ubachs, P. C. Hinnen, et al. · The Astrophysical Journal · 10
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Further tests concerning the hypothesis of H2 as the carrier of diffuse interstellar bands
1996 · P.C. Hinnen, W. Ubachs · Chemical Physics Letters · 10
Intra-field patterning control using high-speed and small-target optical metrology of CD and focus
2015 · Hugo Cramer, Stefan Petra, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
A single metrology tool solution for complete exposure tool setup
2010 · David Laidler, Koen D'havé, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Overlay performance with advanced ATHENA alignment strategies
2003 · Jeroen Huijbregste, Richard J. F. van Haren, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Driving imaging and overlay performance to the limits with advanced lithography optimization
2012 · Jan Mulkens, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Scatterometry-based on-product focus measurement and monitoring
2013 · Paul Hinnen, Vivien Wang, et al. · ASMC proceedings · 6
CD optimization methodology for extending optical lithography
2013 · C. Wong, G. Seevaratnam, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
XUV-laser spectrometer for direct absorption measurements: application to CO in the wavelength range 95–97 nm
1998 · P. C. Hinnen, S. Stolte, et al. · Journal of the Optical Society of America B · 6
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Works count: 42
Citation count: 493
H-index: 13
I10-index: 18
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