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Author

Akiko Harumoto

Institution: SCREEN (Japan)
Observed institution: SCREEN (Japan)
ORCID: 0009-0003-6670-5951
Observed ORCID: 0009-0003-6670-5951
OpenAlex ID: A5107535047
Rate Equation for TiN Etching in Dilute H2O2
2024 · Dai Ueda, Akiko Harumoto · ECS Transactions · 2
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Quantifying reduced negative ion contributions in nano-confined SiO2 wet etching via reaction-pathway analysis
2026 · Dai Ueda, Akiko Harumoto · Micro and Nano Engineering · 1
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Rate Equation for TiN Etching in Dilute H2O2
2024 · Dai Ueda, Akiko Harumoto · ECS Meeting Abstracts · 1
Deuterium Isotopic Effect on Nanometer-Sized Narrow Spaces Formed by Silicon Walls
2024 · Shohei Miyagawa, Masayuki Otsuji, et al. · ECS Transactions · 1
Unique pH Effects on TiN Etching in Nano Confinement with Dilute H2O2 Solutions
2026 · Dai Ueda, Akiko Harumoto · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Electrolyte-Induced Recovery of SiO 2 Wet Etching in Nano-Confined Structures: Implications for Anionic Species Exclusion
2026 · Dai Ueda, Akiko Harumoto, et al. · ECS Journal of Solid State Science and Technology
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Deuterium Isotopic Effect on Nanometer-Sized Narrow Spaces Formed by Silicon Walls
2024 · Shohei Miyagawa, Masayuki Otsuji, et al. · ECS Meeting Abstracts
Works count: 7
Citation count: 5
H-index: 1
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